High-k Gate Dielectrics for CMOS Technology
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Published By Wiley-VCH Verlag Gmbh & Co. Kgaa

9783527646340, 9783527330324

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Interface Engineering in the High-k Dielectric Gate Stacks

High-k Gate Dielectrics for CMOS Technology ◽

10.1002/9783527646340.ch9 ◽

2012 ◽

pp. 293-318

Author(s):

Shijie Wang ◽

Yuanping Feng ◽

Alfred C. H. Huan

Keyword(s):

Interface Engineering ◽

Gate Stacks ◽

High K ◽

High K Dielectric

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Issues in High-k Gate Dielectrics and its Stack Interfaces

High-k Gate Dielectrics for CMOS Technology ◽

10.1002/9783527646340.ch2 ◽

2012 ◽

pp. 31-59 ◽

Author(s):

Hong-Liang Lu ◽

David Wei Zhang

Keyword(s):

Gate Dielectrics ◽

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Metal Gate Electrode for Advanced CMOS Application

High-k Gate Dielectrics for CMOS Technology ◽

10.1002/9783527646340.ch11 ◽

2012 ◽

pp. 355-378 ◽

Author(s):

Wenwu Wang ◽

Xiaolei Wang ◽

Kai Han

Keyword(s):

Gate Electrode ◽

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III-V MOSFETs with ALD High-k Gate Dielectrics

High-k Gate Dielectrics for CMOS Technology ◽

10.1002/9783527646340.ch14 ◽

2012 ◽

pp. 433-470 ◽

Author(s):

Jack C. Lee ◽

Han Zhao

Keyword(s):

Gate Dielectrics ◽

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UV Engineering of High-k Thin Films

High-k Gate Dielectrics for CMOS Technology ◽

10.1002/9783527646340.ch3 ◽

2012 ◽

pp. 61-76

Author(s):

Ian W. Boyd

Keyword(s):

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High-k Dielectrics in Ferroelectric Gate Field Effect Transistors for Nonvolatile Memory Applications

High-k Gate Dielectrics for CMOS Technology ◽

10.1002/9783527646340.ch15 ◽

2012 ◽

pp. 471-499 ◽

Author(s):

Xubing Lu

Keyword(s):

Nonvolatile Memory ◽

Field Effect ◽

Field Effect Transistors ◽

High K ◽

Memory Applications

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Rare-Earth Oxides as High-k Gate Dielectrics for Advanced Device Architectures

High-k Gate Dielectrics for CMOS Technology ◽

10.1002/9783527646340.ch16 ◽

2012 ◽

pp. 501-530

Author(s):

Pooi See Lee ◽

Mei Yin Chan ◽

Peter Damarwan

Keyword(s):

Gate Dielectrics ◽

Rare Earth Oxides ◽

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Hygroscopic Tolerance and Permittivity Enhancement of Lanthanum Oxide (La2O3) for High-k Gate Insulators

High-k Gate Dielectrics for CMOS Technology ◽

10.1002/9783527646340.ch6 ◽

2012 ◽

pp. 185-223

Author(s):

Yi Zhao

Keyword(s):

Lanthanum Oxide ◽

Gate Insulators ◽

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Interfacial Dipole Effects on High-k Gate Stacks

High-k Gate Dielectrics for CMOS Technology ◽

10.1002/9783527646340.ch10 ◽

2012 ◽

pp. 319-353

Author(s):

Li Qiang Zhu

Keyword(s):

Gate Stacks ◽

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Structural and Electrical Characteristics of Alternative High-k Dielectrics for CMOS Applications

High-k Gate Dielectrics for CMOS Technology ◽

10.1002/9783527646340.ch5 ◽

2012 ◽

pp. 111-184 ◽

Author(s):

Fu-Chien Chiu ◽

Somnath Mondal ◽

Tung-Ming Pan

Keyword(s):

Electrical Characteristics ◽

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