High-k Gate Dielectrics for CMOS Technology
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Published By Wiley-VCH Verlag Gmbh & Co. Kgaa

9783527646340, 9783527330324
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Metal Gate Electrode for Advanced CMOS Application

2012 ◽  
pp. 355-378 ◽  
Author(s):  
Wenwu Wang ◽  
Xiaolei Wang ◽  
Kai Han
Keyword(s):  
Gate Electrode ◽  
Metal Gate

Interface Engineering in the High-k Dielectric Gate Stacks

2012 ◽  
pp. 293-318
Author(s):  
Shijie Wang ◽  
Yuanping Feng ◽  
Alfred C. H. Huan
Keyword(s):  
Interface Engineering ◽  
Gate Stacks ◽  
High K ◽  
High K Dielectric

Issues in High-k Gate Dielectrics and its Stack Interfaces

2012 ◽  
pp. 31-59 ◽  
Author(s):  
Hong-Liang Lu ◽  
David Wei Zhang
Keyword(s):  
Gate Dielectrics ◽  
High K

III-V MOSFETs with ALD High-k Gate Dielectrics

2012 ◽  
pp. 433-470 ◽  
Author(s):  
Jack C. Lee ◽  
Han Zhao
Keyword(s):  
Gate Dielectrics ◽  
High K

Theoretical Progress on GaAs (001) Surface and GaAs/High-k Interface

2012 ◽  
pp. 407-431 ◽  
Author(s):  
Weichao Wang ◽  
Ka Xiong ◽  
Robert M. Wallace ◽  
Kyeongjae Cho
Keyword(s):  
Theoretical Progress ◽  
High K

Scaling and Limitation of Si-Based CMOS

2012 ◽  
pp. 1-29 ◽  
Author(s):  
Gang He ◽  
Zhaoqi Sun ◽  
Mao Liu ◽  
Lide Zhang
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