UV Engineering of High-k Thin Films

High-k Gate Dielectrics for CMOS Technology ◽

10.1002/9783527646340.ch3 ◽

2012 ◽

pp. 61-76

Author(s):

Ian W. Boyd

Keyword(s):

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Characteristics of Nickel Oxide Modified Zr-Doped HfO2 High-k Thin Films

ECS Meeting Abstracts ◽

10.1149/ma2021-0212626mtgabs ◽

2021 ◽

Vol MA2021-02 (12) ◽

pp. 626-626

Author(s):

Chia-Han Yang ◽

Yue Kuo

Keyword(s):

Nickel Oxide ◽

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Atomic scale microstructures of high-k HfSiO thin films fabricated by magnetron sputtering

Materials Science and Engineering B ◽

10.1016/j.mseb.2011.10.011 ◽

2012 ◽

Vol 177 (10) ◽

pp. 717-720 ◽

Author(s):

Etienne Talbot ◽

Manuel Roussel ◽

Larysa Khomenkova ◽

Fabrice Gourbilleau ◽

Philippe Pareige

Keyword(s):

Magnetron Sputtering ◽

Atomic Scale ◽

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Investigation of strontium tantalate thin films for high-k gate dielectric applications

Materials Science in Semiconductor Processing ◽

10.1016/j.mssp.2006.10.037 ◽

2006 ◽

Vol 9 (6) ◽

pp. 1102-1107 ◽

Author(s):

M. Silinskas ◽

M. Lisker ◽

B. Kalkofen ◽

E.P. Burte

Keyword(s):

Gate Dielectric ◽

High K ◽

High K Gate Dielectric

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A Simple Route to the Synthesis of Pr2O3 High-k Thin Films

Advanced Materials ◽

10.1002/adma.200304806 ◽

2003 ◽

Vol 15 (13) ◽

pp. 1071-1075 ◽

Author(s):

R. Lo Nigro ◽

R.G. Toro ◽

G. Malandrino ◽

V. Raineri ◽

I.L. Fragalà

Keyword(s):

Simple Route ◽

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Characteristics of Nickel Oxide Modified Zr-Doped HfO2 High-k Thin Films

ECS Transactions ◽

10.1149/10403.0063ecst ◽

2021 ◽

Vol 104 (3) ◽

pp. 63-67

Author(s):

Chia-Han Yang ◽

Yue Kuo

Keyword(s):

Nickel Oxide ◽

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High-k ZrO2 dielectric thin films on GaAs semiconductor with reduced regrowth of native oxides by atomic layer deposition

Chemical Physics Letters ◽

10.1016/j.cplett.2013.08.012 ◽

2013 ◽

Vol 583 ◽

pp. 74-79 ◽

Author(s):

R.B. Konda ◽

C. White ◽

J. Smak ◽

R. Mundle ◽

M. Bahoura ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

Dielectric Thin Films ◽

Native Oxides ◽

Layer Deposition ◽

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Substrate biasing effect on the electrical properties of magnetron-sputtered high-k titanium silicate thin films

Journal of Applied Physics ◽

10.1063/1.2759196 ◽

2007 ◽

Vol 102 (3) ◽

pp. 034106 ◽

Author(s):

D. Brassard ◽

M. A. El Khakani ◽

L. Ouellet

Keyword(s):

Electrical Properties ◽

Titanium Silicate ◽

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Thermodynamics and kinetic behaviors of thickness-dependent crystallization in high-k thin films deposited by atomic layer deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.4903946 ◽

2015 ◽

Vol 33 (1) ◽

pp. 01A140 ◽

Author(s):

Xianglong Nie ◽

Fei Ma ◽

Dayan Ma ◽

Kewei Xu

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

Layer Deposition ◽

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Stability of High-k Thin Films in Moisture Ambience - The Effect of Dissolution Gas from Acryl Apparatus -

32nd European Solid-State Device Research Conference ◽

10.1109/essderc.2002.194999 ◽

2002 ◽

Author(s):

S. Akama ◽

A. Kikuchi ◽

J. Tonotani ◽

S.-I. Ohmi ◽

H. Iwai

Keyword(s):

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A- and B-Site Modified Perovskite Nanosheets and Their Integrations into High-k Dielectric Thin Films

International Journal of Applied Ceramic Technology ◽

10.1111/j.1744-7402.2011.00713.x ◽

2011 ◽

Vol 9 (1) ◽

pp. 29-36 ◽

Author(s):

Minoru Osada ◽

Takayoshi Sasaki

Keyword(s):

Dielectric Thin Films ◽

High K ◽

High K Dielectric

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