Symposium on VLSI Technology
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0.25 /spl mu/m salicide CMOS Technology Thermally Stable Up To 1,000/spl deg/C With High TDDB Reliability

1997 ◽  
Author(s):  
Ohguro ◽  
Nakamttra ◽  
Morifuji ◽  
Yoshitomi ◽  
Morimoto ◽  
...  
Keyword(s):  
Cmos Technology ◽  
Thermally Stable

R-1 Merged Logic And DRAM

1997 ◽  
Author(s):  
Tomisawa ◽  
Ishiuchi ◽  
Choi ◽  
Kalter ◽  
Pollack ◽  
...  

Copper Integration In Self Aligned Dual Damascene Architecture

1997 ◽  
Author(s):  
Morand ◽  
Lerme ◽  
Palleau ◽  
Torres ◽  
Vinet ◽  
...  
Keyword(s):  
Dual Damascene

R-4 Surface Control And Thin Gate Oxides

1997 ◽  
Author(s):  
Taniguchi ◽  
Toriumi ◽  
Huber ◽  
Krisch
Keyword(s):  
Gate Oxides ◽  
Surface Control

A 1T/1C Ferrodectric RAM Using A Double-level Metal Process For Highly Scalable Nonvolatile Memory

1997 ◽  
Author(s):  
Dong-Jin Jung ◽  
Nam-Soo Kang ◽  
Sung-Yung Lee ◽  
Bon-Jae Koo ◽  
Jin-Woo Lee ◽  
...  
Keyword(s):  
Nonvolatile Memory
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