Advances in Patterning Materials and Processes XXXVIII
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9781510640573, 9781510640580
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Today’s scorecard for tomorrow’s photoresist: progress and outlook towards High-NA EUV lithography

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Nano-scale effects of selective spin-on deposition

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Next generation purification method for achieving low trace metals in ultra-high purity chemicals

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EUV lithographic process enablement with novel litho track hardware

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