Study of loading effect during development and etching process in photomask fabrication
A Study of Loading Effect during Electron-Beam Exposure and Etching Process in Photomask Fabrication
1999 ◽
Vol 38
(Part 1, No. 12B)
◽
pp. 6981-6984
1980 ◽
Vol 38
◽
pp. 570-571
Keyword(s):
2015 ◽
Vol E98.A
(7)
◽
pp. 1467-1474
2003 ◽
Vol 69
(9)
◽
pp. 1332-1336
Keyword(s):
Keyword(s):