7th International Symposium on Plasma- and Process-Induced Damage
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Published By American Vacuum Soc

0965157776
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Diagnostics of plasma process induced failure on analog device's mismatch characteristics

2003 ◽  
Author(s):  
J.R. Shih ◽  
A. Huang ◽  
Y.H. Chinn ◽  
C.C. Chin ◽  
Yeng Peng ◽  
...  
Keyword(s):  
Plasma Process

Plasma induced damage from via etching in pMOSFETs

2003 ◽  
Author(s):  
G. Cellere ◽  
M.G. Valentini ◽  
A. Baraldo ◽  
A. Paccagnella

Influence of photoresist pattern on charging damage during high current ion implantation

2003 ◽  
Author(s):  
T. Dirnecker ◽  
A. Ruf ◽  
L. Frey ◽  
A. Beyer ◽  
A.J. Bauer ◽  
...  
Keyword(s):  
Ion Implantation ◽  
High Current

Investigation on dual gate oxide charging damage in 0.13μm copper damascene technology

2003 ◽  
Author(s):  
W.Y. Teo ◽  
Y.T. Hou ◽  
M.F. Li ◽  
P. Chen ◽  
L.H. Ko ◽  
...  
Keyword(s):  
Gate Oxide ◽  
Dual Gate

Impact of F species on plasma charge damage in a RF asher

2003 ◽  
Author(s):  
S.Q. Gu ◽  
R. Fujimoto ◽  
P. McGrath
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