scholarly journals Solar Cells: Low‐Temperature Plasma Processing of Platinum Porphyrins for the Development of Metal Nanostructured Layers (Adv. Mater. Interfaces 14/2017)

2017 ◽  
Vol 4 (14) ◽  
Author(s):  
Alejandro Nicolas Filippin ◽  
Juan Ramon Sanchez‐Valencia ◽  
Jesús Idígoras ◽  
Manuel Macias‐Montero ◽  
Maria Alcaire ◽  
...  
Keyword(s):  
Solar Cells ◽  
Low Temperature ◽  
Plasma Processing ◽  
Low Temperature Plasma ◽  
Temperature Plasma ◽  
Nanostructured Layers

scholarly journals Low‐Temperature Plasma Processing of Platinum Porphyrins for the Development of Metal Nanostructured Layers

2017 ◽  
Vol 4 (14) ◽  
pp. 1601233 ◽  
Author(s):  
Alejandro Nicolas Filippin ◽  
Juan Ramon Sanchez‐Valencia ◽  
Jesús Idígoras ◽  
Manuel Macias‐Montero ◽  
Maria Alcaire ◽  
...  
Keyword(s):  
Low Temperature ◽  
Plasma Processing ◽  
Low Temperature Plasma ◽  
Temperature Plasma ◽  
Nanostructured Layers

Optimization of TiO2 Mesoporous Photoanodes Prepared by Inkjet Printing and Low-Temperature Plasma Processing

2020 ◽  
Vol 40 (5) ◽  
pp. 1311-1330 ◽  
Author(s):  
Tomáš Homola ◽  
Zuzana Ďurašová ◽  
Masoud Shekargoftar ◽  
Pavel Souček ◽  
Petr Dzik
Keyword(s):  
Low Temperature ◽  
Inkjet Printing ◽  
Plasma Processing ◽  
Low Temperature Plasma ◽  
Temperature Plasma

Low-Temperature Plasma Processing of Materials: Past, Present, and Future

2005 ◽  
Vol 2 (1) ◽  
pp. 7-15 ◽  
Author(s):  
Riccardo d'Agostino ◽  
Pietro Favia ◽  
Christian Oehr ◽  
Michael R. Wertheimer
Keyword(s):  
Low Temperature ◽  
Plasma Processing ◽  
Low Temperature Plasma ◽  
Temperature Plasma

Investigation of the vertical electrical transport in a-Si:H/nc-Si:H superlattice thin films

2015 ◽  
Vol 17 (26) ◽  
pp. 17063-17068 ◽  
Author(s):  
Debajyoti Das ◽  
Debjit Kar
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Electrical Transport ◽  
Plasma Processing ◽  
Low Temperature Plasma ◽  
Temperature Plasma ◽  
Size Controlled

Studies on the vertical electrical transport of size-controlled silicon nano-crystallites (Si-ncs) obtained simply by controlling the thickness of the nc-Si:H sub-layer (tnc) in the a-Si:H/nc-Si:H superlattice thin films grown by low temperature plasma processing in PE-CVD.

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