Low-temperature plasma processing for Si photovoltaics

2014 ◽  
Vol 78 ◽  
pp. 1-29 ◽  
Author(s):  
S.Q. Xiao ◽  
S. Xu ◽  
K. Ostrikov
2020 ◽  
Vol 40 (5) ◽  
pp. 1311-1330 ◽  
Author(s):  
Tomáš Homola ◽  
Zuzana Ďurašová ◽  
Masoud Shekargoftar ◽  
Pavel Souček ◽  
Petr Dzik

2005 ◽  
Vol 2 (1) ◽  
pp. 7-15 ◽  
Author(s):  
Riccardo d'Agostino ◽  
Pietro Favia ◽  
Christian Oehr ◽  
Michael R. Wertheimer

2015 ◽  
Vol 17 (26) ◽  
pp. 17063-17068 ◽  
Author(s):  
Debajyoti Das ◽  
Debjit Kar

Studies on the vertical electrical transport of size-controlled silicon nano-crystallites (Si-ncs) obtained simply by controlling the thickness of the nc-Si:H sub-layer (tnc) in the a-Si:H/nc-Si:H superlattice thin films grown by low temperature plasma processing in PE-CVD.


1993 ◽  
Vol 11 (4) ◽  
pp. 1268-1274 ◽  
Author(s):  
E. S. Bulat ◽  
M. Tabasky ◽  
B. Tweed ◽  
C. Herrick ◽  
S. Hankin ◽  
...  

2008 ◽  
Vol 516 (19) ◽  
pp. 6609-6615 ◽  
Author(s):  
K. Ostrikov ◽  
I. Levchenko ◽  
S. Xu ◽  
S.Y. Huang ◽  
Q.J. Cheng ◽  
...  

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