Effect of low temperature plasma processing on physicochemical properties and cooking quality of basmati rice

2015 ◽  
Vol 31 ◽  
pp. 83-90 ◽  
Author(s):  
Rohit Thirumdas ◽  
R.R. Deshmukh ◽  
U.S. Annapure
Keyword(s):  
Low Temperature ◽  
Physicochemical Properties ◽  
Cooking Quality ◽  
Plasma Processing ◽  
Basmati Rice ◽  
Low Temperature Plasma ◽  
Temperature Plasma

Effect of low-temperature plasma on the degradation of omethoate residue and quality of apple and spinach

2018 ◽  
Vol 20 (4) ◽  
pp. 044004 ◽  
Author(s):  
Xingmin SHI ◽  
Jinren LIU ◽  
Guimin XU ◽  
Yueming WU ◽  
Lingge GAO ◽  
...  
Keyword(s):  
Low Temperature ◽  
Low Temperature Plasma ◽  
Temperature Plasma

Electrical Characterization of Low Temperature PECVD Oxides for TSV Applications

2018 ◽  
Vol 2018 (1) ◽  
pp. 000728-000733
Author(s):  
Piotr Mackowiak ◽  
Rachid Abdallah ◽  
Martin Wilke ◽  
Jash Patel ◽  
Huma Ashraf ◽  
...  
Keyword(s):  
Low Temperature ◽  
Electrical Characterization ◽  
Chemical Vapor ◽  
Silicon Substrates ◽  
Low Temperature Plasma ◽  
Temperature Plasma ◽  
Charge Densities ◽  
Doped Silicon

Abstract In the present work we investigate the quality of low temperature Plasma Enhanced Chemical Vapor Deposition (PECVD) and plasma treated Tetraethyl orthosilicate (TEOS)-based TSV-liner films. Different designs of Trough Silicon Via (TSV) Test structures with 10μm and 20μm width and a depth of 100μm have been fabricated. Two differently doped silicon substrates have been used – highly p-doped and moderately doped. The results for break-through, resistivity and capacitance for the 20μm structures show a better performance compared to the 10μm structures. This is mainly due to increased liner thickness in the reduced aspect ratio case. Lower interface traps and oxide charge densities have been observed in the C-V measurements results for the 10μm structures.

Optimization of TiO2 Mesoporous Photoanodes Prepared by Inkjet Printing and Low-Temperature Plasma Processing

2020 ◽  
Vol 40 (5) ◽  
pp. 1311-1330 ◽  
Author(s):  
Tomáš Homola ◽  
Zuzana Ďurašová ◽  
Masoud Shekargoftar ◽  
Pavel Souček ◽  
Petr Dzik
Keyword(s):  
Low Temperature ◽  
Inkjet Printing ◽  
Plasma Processing ◽  
Low Temperature Plasma ◽  
Temperature Plasma

Low-Temperature Plasma Processing of Materials: Past, Present, and Future

2005 ◽  
Vol 2 (1) ◽  
pp. 7-15 ◽  
Author(s):  
Riccardo d'Agostino ◽  
Pietro Favia ◽  
Christian Oehr ◽  
Michael R. Wertheimer
Keyword(s):  
Low Temperature ◽  
Plasma Processing ◽  
Low Temperature Plasma ◽  
Temperature Plasma

Investigation of the vertical electrical transport in a-Si:H/nc-Si:H superlattice thin films

2015 ◽  
Vol 17 (26) ◽  
pp. 17063-17068 ◽  
Author(s):  
Debajyoti Das ◽  
Debjit Kar
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Electrical Transport ◽  
Plasma Processing ◽  
Low Temperature Plasma ◽  
Temperature Plasma ◽  
Size Controlled

Studies on the vertical electrical transport of size-controlled silicon nano-crystallites (Si-ncs) obtained simply by controlling the thickness of the nc-Si:H sub-layer (tnc) in the a-Si:H/nc-Si:H superlattice thin films grown by low temperature plasma processing in PE-CVD.

scholarly journals Synthesis of oxidic powder in nonequilibrium low- temperature plasma with increase of indicators of quality of process

2014 ◽  
Vol 567 ◽  
pp. 012034 ◽  
Author(s):  
Ruz R Saubanov ◽  
V V Zvezdin ◽  
I H Israfilov ◽  
I I Haybullin ◽  
R R Rakhimov
Keyword(s):  
Low Temperature ◽  
Low Temperature Plasma ◽  
Temperature Plasma
Sign in / Sign up

Export Citation Format

Share Document