Conformal Physical Vapor Deposition Assisted by Atomic Layer Deposition and Its Application for Stretchable Conductors

2018 ◽  
Vol 5 (22) ◽  
pp. 1801379 ◽  
Author(s):  
Joong‐Hee Min ◽  
Yi‐An Chen ◽  
I‐Te Chen ◽  
Tianlei Sun ◽  
Dennis T. Lee ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Stretchable Conductors

Continuity and morphology of TaN barriers deposited by Atomic Layer Deposition and comparison with physical vapor deposition

2004 ◽  
Vol 76 (1-4) ◽  
pp. 60-69 ◽  
Author(s):  
Wim F.A. Besling ◽  
Marie-Laurence Ignacimouttou ◽  
Aurelie Humbert ◽  
Maxime Mellier ◽  
Joaquin Torres
Keyword(s):  
Atomic Layer Deposition ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Atomic Layer ◽  
Layer Deposition

scholarly journals Applications of atomic layer deposition and chemical vapor deposition for perovskite solar cells

2020 ◽  
Vol 13 (7) ◽  
pp. 1997-2023 ◽  
Author(s):  
James A. Raiford ◽  
Solomon T. Oyakhire ◽  
Stacey F. Bent
Keyword(s):  
Solar Cells ◽  
Chemical Vapor Deposition ◽  
Atomic Layer Deposition ◽  
Vapor Deposition ◽  
Perovskite Solar Cells ◽  
Chemical Vapor ◽  
Atomic Layer ◽  
Layer Deposition

A review on the versatility of atomic layer deposition and chemical vapor deposition for the fabrication of stable and efficient perovskite solar cells.

Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents

2015 ◽  
Vol 51 (86) ◽  
pp. 15692-15695 ◽  
Author(s):  
A. Delabie ◽  
M. Caymax ◽  
B. Groven ◽  
M. Heyne ◽  
K. Haesevoets ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Atomic Layer ◽  
Reducing Agents ◽  
Layer Deposition ◽  
Temperature Deposition ◽  
The Impact

We demonstrate the impact of reducing agents for Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) of WS2 from WF6 and H2S precursors.

scholarly journals TiO 2 thin film patterns prepared by chemical vapor deposition and atomic layer deposition using an atmospheric pressure microplasma printer

2019 ◽  
Vol 16 (12) ◽  
pp. 1900127 ◽  
Author(s):  
Morteza Aghaee ◽  
Joerie Verheyen ◽  
Alquin A. E. Stevens ◽  
Wilhelmus M. M. Kessels ◽  
Mariadriana Creatore
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Atomic Layer Deposition ◽  
Vapor Deposition ◽  
Atmospheric Pressure ◽  
Chemical Vapor ◽  
Atomic Layer ◽  
Layer Deposition
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