scholarly journals Tin Oxide as a Protective Heterojunction with Silicon for Efficient Photoelectrochemical Water Oxidation in Strongly Acidic or Alkaline Electrolytes

2018 ◽  
Vol 8 (24) ◽  
pp. 1801155 ◽  
Author(s):  
Ivan A. Moreno‐Hernandez ◽  
Bruce S. Brunschwig ◽  
Nathan S. Lewis
Keyword(s):  
Tin Oxide ◽  
Water Oxidation ◽  
Alkaline Electrolytes ◽  
Photoelectrochemical Water Oxidation

scholarly journals Correction: Enhanced photoelectrochemical water oxidation via atomic layer deposition of TiO2on fluorine-doped tin oxide nanoparticle films

Nanoscale ◽  
2015 ◽  
Vol 7 (28) ◽  
pp. 12226-12226 ◽  
Author(s):  
Isvar A. Cordova ◽  
Qing Peng ◽  
Isa L. Ferrall ◽  
Adam J. Rieth ◽  
Paul G. Hoertz ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Tin Oxide ◽  
Water Oxidation ◽  
Atomic Layer ◽  
Nanoparticle Films ◽  
Layer Deposition ◽  
Oxide Nanoparticle ◽  
Photoelectrochemical Water Oxidation

Ultrathin alumina passivation for improved photoelectrochemical water oxidation catalysis of tin oxide sensitized by a phosphonate-functionalized perylene diimide first without, and then with, CoOy

2021 ◽  
Author(s):  
Carly F. Jewell ◽  
Ashwanth Subramanian ◽  
Chang-Yong Nam ◽  
Richard G. Finke
Keyword(s):  
Catalytic Activity ◽  
Tin Oxide ◽  
Water Oxidation ◽  
Oxidation Catalysis ◽  
Perylene Diimide ◽  
Water Oxidation Catalysis ◽  
Photoelectrochemical Water Oxidation

Deposition of an ultrathin AlOx overlayer applied by ALD on the PMPDI/SnO2 photoanode improves the photoactivity and catalytic activity of the system. ALD AlOx also helps support the understanding of the “anti-catalysis” behavior of added CoOy.

Conformal SnOx heterojunction coatings for stabilized photoelectrochemical water oxidation using arrays of silicon microcones

2020 ◽  
Vol 8 (18) ◽  
pp. 9292-9301
Author(s):  
Ivan A. Moreno-Hernandez ◽  
Sisir Yalamanchili ◽  
Harold J. Fu ◽  
Harry A. Atwater ◽  
Bruce S. Brunschwig ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Oxide Layer ◽  
Tin Oxide ◽  
Water Oxidation ◽  
Surface Recombination ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Photoelectrochemical Water Oxidation

A protective tin oxide layer formed by atomic-layer deposition limits surface recombination at n-Si surfaces and produces ∼620 mV of photovoltage on planar n-Si photoanodes. The layer conformally coats structures such as Si microcone arrays.

Enhanced stability of silicon for photoelectrochemical water oxidation through self-healing enabled by an alkaline protective electrolyte

2020 ◽  
Vol 13 (11) ◽  
pp. 4132-4141
Author(s):  
Harold J. Fu ◽  
Ivan A. Moreno-Hernandez ◽  
Pakpoom Buabthong ◽  
Kimberly M. Papadantonakis ◽  
Bruce S. Brunschwig ◽  
...  
Keyword(s):  
Water Oxidation ◽  
Open Circuit ◽  
Self Healing ◽  
Alkaline Electrolytes ◽  
Photoelectrochemical Water Oxidation ◽  
Enhanced Stability

The addition of [Fe(CN)6]3− to alkaline electrolytes impede the corrosion of Si photoanodes at open circuit due to the formation of a SiOx layer.

Sn-doped hematite films as photoanodes for efficient photoelectrochemical water oxidation

2015 ◽  
Vol 3 (13) ◽  
pp. 6751-6755 ◽  
Author(s):  
Dong-Dong Qin ◽  
Yun-Lei Li ◽  
Ting Wang ◽  
Yang Li ◽  
Xiao-Quan Lu ◽  
...  
Keyword(s):  
Tin Oxide ◽  
Water Oxidation ◽  
Electrochemically Deposited ◽  
Oxide Substrate ◽  
Photoelectrochemical Water Oxidation

Sn-doped hematite films were electrochemically deposited on a fluorine-doped tin oxide substrate for use as an anode for efficient photoelectrochemical water oxidation.

Development of ternary iron vanadium oxide semiconductors for applications in photoelectrochemical water oxidation

RSC Advances ◽  
2016 ◽  
Vol 6 (6) ◽  
pp. 4992-4999 ◽  
Author(s):  
Harahari Mandal ◽  
Sanjib Shyamal ◽  
Paramita Hajra ◽  
Aparajita Bera ◽  
Debasis Sariket ◽  
...  
Keyword(s):  
Thin Film ◽  
Vanadium Oxide ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Water Oxidation ◽  
Oxide Semiconductors ◽  
Coated Glass ◽  
Photoelectrochemical Water Oxidation

Herein, we report the synthesis and photoelectrochemical characterizations of n-type Fe–V-oxide semiconductors thin film via drop cast method in different proportions onto indium tin oxide coated glass followed by annealing in air at 500 °C for 3 h.

scholarly journals Synthesis of a monoclinic BiVO4 nanorod array as the photocatalyst for efficient photoelectrochemical water oxidation

RSC Advances ◽  
2017 ◽  
Vol 7 (13) ◽  
pp. 7547-7554 ◽  
Author(s):  
Bing-Chang Xiao ◽  
Lu-Yin Lin ◽  
Jia-Yo Hong ◽  
Hong-Syun Lin ◽  
Yung-Tao Song
Keyword(s):  
Tin Oxide ◽  
Water Oxidation ◽  
Solution Method ◽  
Nanorod Array ◽  
Simple Solution ◽  
Photoelectrochemical Water Oxidation ◽  
Monoclinic Bivo4

The BiVO4 nanorod array is successfully synthesized on fluorine-doped tin oxide (FTO) glasses via a simple solution method, and the electrode is applied as the photoanode for water oxidation.

Enhanced photoelectrochemical water oxidation via atomic layer deposition of TiO2 on fluorine-doped tin oxide nanoparticle films

Nanoscale ◽  
2015 ◽  
Vol 7 (18) ◽  
pp. 8584-8592 ◽  
Author(s):  
Isvar A. Cordova ◽  
Qing Peng ◽  
Isa L. Ferrall ◽  
Adam J. Rieth ◽  
Paul G. Hoertz ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Tin Oxide ◽  
Water Oxidation ◽  
Atomic Layer ◽  
Solution Processing ◽  
Nanoparticle Films ◽  
Layer Deposition ◽  
Oxide Nanoparticle ◽  
Conversion Efficiencies ◽  
Photoelectrochemical Water Oxidation

In this study, nanostructured photoanodes with heightened photoelectrochemical conversion efficiencies were synthesized by atomic layer deposition (ALD) of TiO2 onto a fluorine-doped tin oxide nanoparticle (nanoFTO) scaffold fabricated by solution processing.

Sign in / Sign up

Export Citation Format

Share Document