ChemInform Abstract: Indium tert-Butylthiolates as Single Source Precursors for Indium Sulfide Thin Films: Is Molecular Design Enough?

ChemInform ◽  
2010 ◽  
Vol 24 (32) ◽  
pp. no-no
Author(s):  
A. N. MACINNES ◽  
M. B. POWER ◽  
A. F. HEPP ◽  
A. R. BARRON
Keyword(s):  
Thin Films ◽  
Molecular Design ◽  
Indium Sulfide ◽  
Single Source ◽  
Single Source Precursors

Indium tert-butylthiolates as single source precursors for indium sulfide thin films: Is molecular design enough?

1993 ◽  
Vol 449 (1-2) ◽  
pp. 95-104 ◽  
Author(s):  
Andrew N. MacInnes ◽  
Michael B. Power ◽  
Aloysius F. Hepp ◽  
Andrew R. Barron
Keyword(s):  
Thin Films ◽  
Molecular Design ◽  
Indium Sulfide ◽  
Single Source ◽  
Single Source Precursors

Chemical vapour deposition of II–VI semiconductor thin films using M[(TePiPr2)2N]2(M = Cd, Hg) as single-source precursors

2006 ◽  
Vol 16 (10) ◽  
pp. 966-969 ◽  
Author(s):  
Shivram S. Garje ◽  
Jamie S. Ritch ◽  
Dana J. Eisler ◽  
Mohammad Afzaal ◽  
Paul O'Brien ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Single Source ◽  
Single Source Precursors ◽  
Semiconductor Thin Films

Group III Metal Sulfide Thin Films From Single-Source Precursors by Chemical Vapor Deposition (CVD) Techniques

1999 ◽  
Vol 606 ◽  
Author(s):  
Mike R. Lazell ◽  
Paul O'brien ◽  
David J. Otway ◽  
Jin-Ho Park
Keyword(s):  
Thin Films ◽  
Vapor Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Metal Sulfide ◽  
Chemical Vapor ◽  
Single Source ◽  
Group 13 ◽  
Single Source Precursors ◽  
Group Iii

AbstractSeveral single-source precursors including In(SOCNiBu2)3, In(S2CNMeHex)3 and Ga(S2CNMeR)3, (R = Et, Bu, Hex) have been prepared and used for the deposition of Group 13 metal sulfide thin films. The α and β-In2S3thin films on borosilicate glass and oc-Ga 2S3thin films on GaAs(111) single crystal substrates were prepared from the precursors by various chemical vapour deposition (CVD) techniques. These semicondcuting materials have been characterized by XRD, SEM, XPS and EDAX.

scholarly journals Combining single source chemical vapour deposition precursors to explore the phase space of titanium oxynitride thin films

2018 ◽  
Vol 47 (31) ◽  
pp. 10536-10543 ◽  
Author(s):  
Kelly Rees ◽  
Emanuela Lorusso ◽  
Samuel D. Cosham ◽  
Alexander N. Kulak ◽  
Geoffrey Hyett
Keyword(s):  
Thin Films ◽  
Phase Space ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Single Source ◽  
Single Source Precursors

Combining single-source precursors in aerosol assisted CVD allows control of the composition of mixed anion titanium oxynitride thin films.

scholarly journals Synthesis and properties of MoCl4complexes with thio- and seleno-ethers and their use for chemical vapour deposition of MoSe2and MoS2films

2018 ◽  
Vol 47 (7) ◽  
pp. 2406-2414 ◽  
Author(s):  
Yao-Pang Chang ◽  
Andrew L. Hector ◽  
William Levason ◽  
Gillian Reid ◽  
Joshua Whittam
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Single Source ◽  
Chloride Complexes ◽  
Single Source Precursors

A new series of Mo(iv) chloride complexes with thioether and seleneoether ligands is reported; [MoCl4(nBu2E)2] (E = S, Se) function as single source precursors for the CVD of MoE2thin films.

Deposition of II-VI Thin Films by LP-MOCVD Using Novel Single-Source Precursors

2004 ◽  
Vol 2004 (1) ◽  
pp. 171-177 ◽  
Author(s):  
Mohammad Afzaal ◽  
David Crouch ◽  
Mohmmad A. Malik ◽  
Majid Motevalli ◽  
Paul O’Brien ◽  
...  
Keyword(s):  
Thin Films ◽  
Single Source ◽  
Single Source Precursors

Iron Thiobiurets: Single-Source Precursors for Iron Sulfide Thin Films

2010 ◽  
Vol 49 (18) ◽  
pp. 8495-8503 ◽  
Author(s):  
Karthik Ramasamy ◽  
Mohammad A. Malik ◽  
Madeline Helliwell ◽  
Floriana Tuna ◽  
Paul O’Brien
Keyword(s):  
Thin Films ◽  
Iron Sulfide ◽  
Single Source ◽  
Single Source Precursors

Intramolecularly Coordinated Gallium Sulfides: Suitable Single Source Precursors for GaS Thin Films

2016 ◽  
Vol 22 (52) ◽  
pp. 18817-18823 ◽  
Author(s):  
Tomáš Řičica ◽  
Tomáš Světlík ◽  
Libor Dostál ◽  
Aleš Růžička ◽  
Květoslav Růžička ◽  
...  
Keyword(s):  
Thin Films ◽  
Single Source ◽  
Single Source Precursors
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