Stacked gate insulator of photooxide and PECVD film from SiH4 and N2O for low-temperature poly-Si thin-film transistor
2003 ◽
Vol 86
(11)
◽
pp. 21-28
2002 ◽
Vol 41
(Part 1, No. 6A)
◽
pp. 3646-3650
◽
Keyword(s):
Keyword(s):
2006 ◽
Vol 37
(1)
◽
pp. 254
◽
Keyword(s):
2006 ◽
Vol 45
(5B)
◽
pp. 4321-4324
◽
Keyword(s):
Keyword(s):
2003 ◽
Vol 34
(1)
◽
pp. 224
◽
2008 ◽
Vol 29
(3)
◽
pp. 235-237
◽