Water Content of Hydrated Polymer Brushes Measured by an In Situ Combination of a Quartz Crystal Microbalance with Dissipation Monitoring and Spectroscopic Ellipsometry

2011 ◽  
Vol 32 (24) ◽  
pp. 1972-1978 ◽  
Author(s):  
Jagoba J. Iturri Ramos ◽  
Sergio E. Moya
Keyword(s):  
Water Content ◽  
Quartz Crystal Microbalance ◽  
Spectroscopic Ellipsometry ◽  
Polymer Brushes ◽  
Quartz Crystal

Monitoring Organic Thin Film Growth In Aqueous Solution In-situ With A Combined Quartz Crystal Microbalance and Ellipsometry

2008 ◽  
Vol 1146 ◽  
Author(s):  
Amitabha Sarkar ◽  
Tapani Viitala ◽  
Tino Hofmann ◽  
Tom E. Tiwald ◽  
John A. Woollam ◽  
...  
Keyword(s):  
Thin Film ◽  
Aqueous Solution ◽  
Water Content ◽  
Quartz Crystal Microbalance ◽  
Quartz Crystal ◽  
Film Growth ◽  
High Water Content ◽  
Organic Thin Film ◽  
Polymer Thin Film

AbstractThe change of the visible light ellipsometric parameters and mechanical harmonic frequencies of a hydrophobic gold surface attached to a quartz crystal are measured in aqueous solution during deposition of synperonic polymer thin film. The ellipsometry data reveal the amount of polymer mass attached to the surface, while the mechanical resonance shifts are caused by the total mass attached to the surface. Analysis of the combined ellipsometry and quartz crystal microbalance data reveal that the polymer thin film has a high water content, and we determine in-situ, for the first time, the porosity, or the water content, of a polymer thin film in aqueous solution.

Vacuum Ultraviolet Irradiation of Polymers

1998 ◽  
Vol 544 ◽  
Author(s):  
A. C. Fozza ◽  
A. Bergeron ◽  
J. E. Klemberg-Sapieha ◽  
M. R. Wertheimer
Keyword(s):  
Quartz Crystal Microbalance ◽  
Spectroscopic Ellipsometry ◽  
Ultraviolet Irradiation ◽  
Quartz Crystal ◽  
Vacuum Ultraviolet ◽  
Ex Situ ◽  
Light Sources ◽  
Argon Mixture ◽  
Vacuum Uv

AbstractThe interest in incoherent sources for wavelength selective photochemistry has increased lately, but little is still known about the behavior of polymers when exposed to far UV and vacuum UV (VUV) radiation, for example that emitted from low-pressure plasmas. In order to study VUV-UV effects on several polymers (polyethylene - PE, polystyrene - PS, hexatriacontane - HTC, polymethylmethacrylate - PMMA and polycarbonate - PC), we used the wellcharacterized emissions from hydrogen and hydrogen/argon mixture plasmas as light sources. Mass changes were measured in-situ using a quartz crystal microbalance (QCM); irradiated samples were analyzed ex-situ by XPS, spectroscopic ellipsometry, and AFM.

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