Studies of the Plasma Related Oxygen Contamination of Gallium Nitride Grown by Remote Plasma Enhanced Chemical Vapour Deposition

K.S.A. Butcher;  Afifuddin; P.P.-T. Chen; T.L. Tansley

doi:10.1002/pssc.200390012

Studies of the Plasma Related Oxygen Contamination of Gallium Nitride Grown by Remote Plasma Enhanced Chemical Vapour Deposition

physica status solidi (c) ◽

10.1002/pssc.200390012 ◽

2003 ◽

Vol 0 (1) ◽

pp. 156-160 ◽

Cited By ~ 8

Author(s):

K.S.A. Butcher ◽

Afifuddin ◽

P.P.-T. Chen ◽

T.L. Tansley

Keyword(s):

Gallium Nitride ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Remote Plasma ◽

Oxygen Contamination

Download Full-text

Low-temperature epitaxial growth of InP by remote plasma-assisted metalorganic chemical vapour deposition

Journal of Crystal Growth ◽

10.1016/0022-0248(95)00479-3 ◽

1996 ◽

Vol 166 (1-4) ◽

pp. 628-630 ◽

Cited By ~ 3

Author(s):

Takashi Sugino ◽

Masahiro Maeda ◽

Ken'ichi Kawarai ◽

Junji Shirafuji

Keyword(s):

Low Temperature ◽

Epitaxial Growth ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Remote Plasma ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

Download Full-text

InAlGaN-based ridge-guide laser diodes using remote plasma chemical vapour deposition for enhanced performance

Novel In-Plane Semiconductor Lasers XX ◽

10.1117/12.2584047 ◽

2021 ◽

Author(s):

Josh D. Brown ◽

Satya Barik ◽

Qian Gao ◽

Brad Siskavich ◽

Marie Wintrebert-Fouquet ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Laser Diodes ◽

Chemical Vapour ◽

Remote Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Ridge Guide

Download Full-text

Growth of gold-palladium alloy catalyzed gallium nitride nanowires by chemical vapour deposition

Materials Letters ◽

10.1016/j.matlet.2018.01.059 ◽

2018 ◽

Vol 217 ◽

pp. 100-103 ◽

Cited By ~ 5

Author(s):

S. Sanjay ◽

K. Prabakaran ◽

Shubra Singh ◽

K. Baskar

Keyword(s):

Gallium Nitride ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Palladium Alloy

Download Full-text

Growth and Characterization of Gallium Nitride Nanowires on Nickel/Sapphire Template by Chemical Vapour Deposition

Springer Proceedings in Physics - The Physics of Semiconductor Devices ◽

10.1007/978-3-319-97604-4_38 ◽

2019 ◽

pp. 249-254

Author(s):

Sankaranarayanan Sanjay ◽

Prabakaran Kandasamy ◽

Shubra Singh ◽

Krishnan Baskar

Keyword(s):

Gallium Nitride ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour

Download Full-text

Porous SiO2 films prepared by remote plasma-enhanced chemical vapour deposition – a novel antireflection coating technology for photovoltaic modules

Solar Energy Materials and Solar Cells ◽

10.1016/s0927-0248(00)00079-9 ◽

2001 ◽

Vol 65 (1-4) ◽

pp. 71-77 ◽

Cited By ~ 46

Author(s):

H Nagel ◽

A Metz ◽

R Hezel

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Antireflection Coating ◽

Remote Plasma ◽

Coating Technology ◽

Sio2 Films ◽

Photovoltaic Modules ◽

Porous Sio2

Download Full-text

Preparation of device-quality SiO2 thin films by remote plasma-enhanced chemical vapour deposition (PECVD): Applications in metal-oxide-semiconductor (MOS) devices

Advanced Materials for Optics and Electronics ◽

10.1002/(sici)1099-0712(199603)6:2<55::aid-amo226>3.0.co;2-j ◽

1996 ◽

Vol 6 (2) ◽

pp. 55-72 ◽

Cited By ~ 10

Author(s):

Gerald Lucovsky

Keyword(s):

Thin Films ◽

Metal Oxide ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Metal Oxide Semiconductor ◽

Oxide Semiconductor ◽

Remote Plasma ◽

Mos Devices

Download Full-text

Remote plasma-enhanced chemical vapour deposition of silicon nitride films: the effect of diluting nitrogen with helium

Journal of Materials Chemistry ◽

10.1039/jm9950500457 ◽

1995 ◽

Vol 5 (3) ◽

pp. 457 ◽

Cited By ~ 8

Author(s):

Sergei E. Alexandrov ◽

Michael L. Hitchman ◽

Sarkis H. Shamlian

Keyword(s):

Silicon Nitride ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Remote Plasma ◽

Silicon Nitride Films

Download Full-text

Remote plasma chemical vapour deposition of group III-nitride tunnel junctions for LED applications

Light-Emitting Devices, Materials, and Applications ◽

10.1117/12.2513261 ◽

2019 ◽

Author(s):

S. Barik ◽

D. Liu ◽

J. D. Brown ◽

M. Wintrebert-Fouquet ◽

A. J. Fernandes ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Tunnel Junctions ◽

Chemical Vapour ◽

Remote Plasma ◽

Plasma Chemical ◽

Group Iii ◽

Plasma Chemical Vapour Deposition ◽

Group Iii Nitride

Download Full-text

Formation of silicon nitride films by remote plasma-enhanced chemical vapour deposition

Advanced Materials for Optics and Electronics ◽

10.1002/amo.860020605 ◽

1993 ◽

Vol 2 (6) ◽

pp. 301-312 ◽

Cited By ~ 9

Author(s):

Sergei E. Alexandrov ◽

Michael L. Hitchman ◽

Sarkis Shamlian

Keyword(s):

Silicon Nitride ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Remote Plasma ◽

Silicon Nitride Films

Download Full-text

Remote plasma chemical vapour deposition of silicon films at low temperature with H2and He plasma gases

Journal of Physics D Applied Physics ◽

10.1088/0022-3727/32/16/302 ◽

1999 ◽

Vol 32 (16) ◽

pp. 1955-1962 ◽

Cited By ~ 8

Author(s):

Young-Bae Park ◽

Xiaodong Li ◽

Shi-Woo Rhee ◽

Dong-Wha Park

Keyword(s):

Low Temperature ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Silicon Films ◽

Remote Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition

Download Full-text