Porous SiO2 films prepared by remote plasma-enhanced chemical vapour deposition – a novel antireflection coating technology for photovoltaic modules

H Nagel; A Metz; R Hezel

doi:10.1016/s0927-0248(00)00079-9

Porous SiO2 films prepared by remote plasma-enhanced chemical vapour deposition – a novel antireflection coating technology for photovoltaic modules

Solar Energy Materials and Solar Cells ◽

10.1016/s0927-0248(00)00079-9 ◽

2001 ◽

Vol 65 (1-4) ◽

pp. 71-77 ◽

Cited By ~ 46

Author(s):

H Nagel ◽

A Metz ◽

R Hezel

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Antireflection Coating ◽

Remote Plasma ◽

Coating Technology ◽

Sio2 Films ◽

Photovoltaic Modules ◽

Porous Sio2

Download Full-text

Low-temperature epitaxial growth of InP by remote plasma-assisted metalorganic chemical vapour deposition

Journal of Crystal Growth ◽

10.1016/0022-0248(95)00479-3 ◽

1996 ◽

Vol 166 (1-4) ◽

pp. 628-630 ◽

Cited By ~ 3

Author(s):

Takashi Sugino ◽

Masahiro Maeda ◽

Ken'ichi Kawarai ◽

Junji Shirafuji

Keyword(s):

Low Temperature ◽

Epitaxial Growth ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Remote Plasma ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

Download Full-text

Studies of the Plasma Related Oxygen Contamination of Gallium Nitride Grown by Remote Plasma Enhanced Chemical Vapour Deposition

physica status solidi (c) ◽

10.1002/pssc.200390012 ◽

2003 ◽

Vol 0 (1) ◽

pp. 156-160 ◽

Cited By ~ 8

Author(s):

K.S.A. Butcher ◽

Afifuddin ◽

P.P.-T. Chen ◽

T.L. Tansley

Keyword(s):

Gallium Nitride ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Remote Plasma ◽

Oxygen Contamination

Download Full-text

InAlGaN-based ridge-guide laser diodes using remote plasma chemical vapour deposition for enhanced performance

Novel In-Plane Semiconductor Lasers XX ◽

10.1117/12.2584047 ◽

2021 ◽

Author(s):

Josh D. Brown ◽

Satya Barik ◽

Qian Gao ◽

Brad Siskavich ◽

Marie Wintrebert-Fouquet ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Laser Diodes ◽

Chemical Vapour ◽

Remote Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Ridge Guide

Download Full-text

Efficiency of the SiH4 oxidation reaction in chemical vapour deposition of SiO2 films at low temperature

Thin Solid Films ◽

10.1016/0040-6090(83)90052-4 ◽

1983 ◽

Vol 102 (4) ◽

pp. 361-366 ◽

Cited By ~ 22

Author(s):

C. Cobianu ◽

C. Pavelescu

Keyword(s):

Low Temperature ◽

Chemical Vapour Deposition ◽

Oxidation Reaction ◽

Vapour Deposition ◽

Chemical Vapour ◽

Sio2 Films

Download Full-text

Silane oxidation study: Analysis of data for SiO2 films deposited by low temperature chemical vapour deposition

Thin Solid Films ◽

10.1016/0040-6090(84)90288-8 ◽

1984 ◽

Vol 117 (3) ◽

pp. 211-216 ◽

Cited By ~ 7

Author(s):

C. Cobianu ◽

C. Pavelescu

Keyword(s):

Low Temperature ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Study Analysis ◽

Sio2 Films ◽

Oxidation Study

Download Full-text

Preparation of device-quality SiO2 thin films by remote plasma-enhanced chemical vapour deposition (PECVD): Applications in metal-oxide-semiconductor (MOS) devices

Advanced Materials for Optics and Electronics ◽

10.1002/(sici)1099-0712(199603)6:2<55::aid-amo226>3.0.co;2-j ◽

1996 ◽

Vol 6 (2) ◽

pp. 55-72 ◽

Cited By ~ 10

Author(s):

Gerald Lucovsky

Keyword(s):

Thin Films ◽

Metal Oxide ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Metal Oxide Semiconductor ◽

Oxide Semiconductor ◽

Remote Plasma ◽

Mos Devices

Download Full-text

Remote plasma-enhanced chemical vapour deposition of silicon nitride films: the effect of diluting nitrogen with helium

Journal of Materials Chemistry ◽

10.1039/jm9950500457 ◽

1995 ◽

Vol 5 (3) ◽

pp. 457 ◽

Cited By ~ 8

Author(s):

Sergei E. Alexandrov ◽

Michael L. Hitchman ◽

Sarkis H. Shamlian

Keyword(s):

Silicon Nitride ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Remote Plasma ◽

Silicon Nitride Films

Download Full-text

On the role of carrier gas in the deposition kinetics of SiO2 films produced by low temperature chemical vapour deposition

Thin Solid Films ◽

10.1016/0040-6090(87)90220-3 ◽

1987 ◽

Vol 146 (2) ◽

pp. 183-189 ◽

Cited By ~ 1

Author(s):

C. Cobianu ◽

C. Pavelescu ◽

E. Segal

Keyword(s):

Low Temperature ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Sio2 Films ◽

Deposition Kinetics ◽

Carrier Gas ◽

Kinetics Of

Download Full-text

Remote Microwave Plasma Enhanced Chemical Vapour Deposition of SiO2 Films : Oxygen Plasma Diagnostic

Journal de Physique IV (Proceedings) ◽

10.1051/jphyscol:1995574 ◽

1995 ◽

Vol 05 (C5) ◽

pp. C5-621-C5-628 ◽

Cited By ~ 3

Author(s):

C. Regnier ◽

J. Desmaison ◽

P. Tristant ◽

D. Merle

Keyword(s):

Chemical Vapour Deposition ◽

Oxygen Plasma ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Plasma Diagnostic ◽

Sio2 Films

Download Full-text

Remote plasma chemical vapour deposition of group III-nitride tunnel junctions for LED applications

Light-Emitting Devices, Materials, and Applications ◽

10.1117/12.2513261 ◽

2019 ◽

Author(s):

S. Barik ◽

D. Liu ◽

J. D. Brown ◽

M. Wintrebert-Fouquet ◽

A. J. Fernandes ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Tunnel Junctions ◽

Chemical Vapour ◽

Remote Plasma ◽

Plasma Chemical ◽

Group Iii ◽

Plasma Chemical Vapour Deposition ◽

Group Iii Nitride

Download Full-text