Monte Carlo simulation of low–medium energy electrons backscattered from C/Al double layer thin films

2006 ◽  
Vol 38 (8) ◽  
pp. 1198-1203 ◽  
Author(s):  
Maurizio Dapor
Author(s):  
D. R. Liu ◽  
S. S. Shinozaki ◽  
R. J. Baird

The epitaxially grown (GaAs)Ge thin film has been arousing much interest because it is one of metastable alloys of III-V compound semiconductors with germanium and a possible candidate in optoelectronic applications. It is important to be able to accurately determine the composition of the film, particularly whether or not the GaAs component is in stoichiometry, but x-ray energy dispersive analysis (EDS) cannot meet this need. The thickness of the film is usually about 0.5-1.5 μm. If Kα peaks are used for quantification, the accelerating voltage must be more than 10 kV in order for these peaks to be excited. Under this voltage, the generation depth of x-ray photons approaches 1 μm, as evidenced by a Monte Carlo simulation and actual x-ray intensity measurement as discussed below. If a lower voltage is used to reduce the generation depth, their L peaks have to be used. But these L peaks actually are merged as one big hump simply because the atomic numbers of these three elements are relatively small and close together, and the EDS energy resolution is limited.


1977 ◽  
Vol 40 (1) ◽  
pp. 47-58 ◽  
Author(s):  
D. Kashchiev ◽  
J.P. van der Eerden ◽  
C. van Leeuwen

2008 ◽  
Vol 25 (12) ◽  
pp. 4456-4458 ◽  
Author(s):  
Jiang Shao-Ji ◽  
Yu Meng-Ying ◽  
Wei Yu-Wei ◽  
Tang Ji-Jia

1998 ◽  
Vol 109 (17) ◽  
pp. 7362-7371 ◽  
Author(s):  
Dezső Boda ◽  
Kwong-Yu Chan ◽  
Douglas Henderson

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