Ablation of sol-gel coatings by excimer laser irradiation

Author(s):  
S. Janicot ◽  
B. Godard
2000 ◽  
Vol 39 (Part 2, No. 7B) ◽  
pp. L713-L715 ◽  
Author(s):  
Toshimi Nagase ◽  
Toshihiko Ooie ◽  
Yoji Makita ◽  
Masahiro Nakatsuka ◽  
Kazuo Shinozaki ◽  
...  

2001 ◽  
Vol 40 (Part 1, No. 11) ◽  
pp. 6296-6303 ◽  
Author(s):  
Toshimi Nagase ◽  
Toshihiko Ooie ◽  
Yoji Makita ◽  
Shuji Kasaishi ◽  
Masahiro Nakatsuka ◽  
...  

2003 ◽  
Vol 42 (Part 1, No. 3) ◽  
pp. 1179-1184 ◽  
Author(s):  
Toshimi Nagase ◽  
Toshihiko Ooie ◽  
Hiroko Kominami ◽  
Yoichiro Nakanishi ◽  
Nobuyasu Mizutani

1996 ◽  
Vol 429 ◽  
Author(s):  
R. E.Van de Leest ◽  
F. Roozeboom

AbstractVarious annealing methods for sol-gel films have been investigated. Thermal, photothermal, RTP and excimer laser annealing have been used to convert sol-gel precursor films into oxidic films. RTP annealing of sol-gel films yields better results than classical thermal annealing or excimer laser irradiation. Photochemical effects during RTP annealing contribute to obtain high-quality oxide films. The various annealing methods are illustrated by the annealing of alkoxide precursor films of tantalum, iron, nickel and yttrium.


2003 ◽  
Author(s):  
Kazuyuki Hayashi ◽  
Toshihiko Ooie ◽  
Toshimi Nagase ◽  
Tatsuya Shinozaki ◽  
Takao Araki

Author(s):  
Kaoru Igarashi ◽  
Hideaki Saito ◽  
Tomoo Fujioka ◽  
Satoru Fujitsu ◽  
Kunihito Koumoto ◽  
...  

1994 ◽  
Vol 33 (Part 1, No. 8) ◽  
pp. 4764-4768 ◽  
Author(s):  
Yuji Hamada ◽  
Shunichi Kawanishi ◽  
Masanobu Nishii ◽  
Shun'ichi Sugimoto ◽  
Tadashi Yamamoto

Sign in / Sign up

Export Citation Format

Share Document