Generation of millimeter-waves by means of electron beam cyclotron resonance

10.1007/978-1-349-00447-8_58 ◽

1963 ◽

pp. 343-348

Author(s):

Y. Suematsu ◽

H. Isobe ◽

A. Azumi

Keyword(s):

Electron Beam ◽

Millimeter Waves ◽

Cyclotron Resonance

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Self-Induced Transparency and Electromagnetic Pulse Compression in a Plasma or an Electron Beam under Cyclotron Resonance Conditions

Physical Review Letters ◽

10.1103/physrevlett.105.265001 ◽

2010 ◽

Vol 105 (26) ◽

Author(s):

N. S. Ginzburg ◽

I. V. Zotova ◽

A. S. Sergeev

Keyword(s):

Electron Beam ◽

Cyclotron Resonance ◽

Electromagnetic Pulse ◽

Pulse Compression ◽

Induced Transparency

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Low-damage electron-beam-assisted dry etching of GaAs and AlGaAs using electron cyclotron resonance plasma electron source

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.586892 ◽

1993 ◽

Vol 11 (6) ◽

pp. 2288 ◽

Author(s):

Heiji Watanabe

Keyword(s):

Electron Beam ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Dry Etching ◽

Plasma Electron ◽

Electron Source ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Electron Source ◽

Resonance Plasma

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Electromagnetic pulse stopping under cyclotron resonance interaction with backward rectilinear electron beam

2011 International Conference on Infrared, Millimeter, and Terahertz Waves ◽

10.1109/irmmw-thz.2011.6104952 ◽

2011 ◽

Author(s):

Irina V. Zotova ◽

Naum S. Ginzburg ◽

Alexander S. Sergeev

Keyword(s):

Electron Beam ◽

Cyclotron Resonance ◽

Electromagnetic Pulse ◽

Resonance Interaction ◽

Rectilinear Electron Beam

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New in situ electron beam patterning process for GaAs using an electron-cyclotron-resonance plasma-oxidized mask and Cl2 gas etching

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.586032 ◽

1992 ◽

Vol 10 (6) ◽

pp. 2711 ◽

Author(s):

N. Takado

Keyword(s):

Electron Beam ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Electron Beam Patterning ◽

Resonance Plasma

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Electron‐beam‐assisted dry etching for GaAs using electron cyclotron resonance plasma electron source

Applied Physics Letters ◽

10.1063/1.107994 ◽

1992 ◽

Vol 61 (25) ◽

pp. 3011-3013 ◽

Author(s):

Heiji Watanabe ◽

Shinji Matsui

Keyword(s):

Electron Beam ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Dry Etching ◽

Plasma Electron ◽

Electron Source ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Electron Source ◽

Resonance Plasma

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Multicharged ion source based on Penning-type discharge with electron cyclotron resonance heating by millimeter waves

Review of Scientific Instruments ◽

10.1063/1.3669793 ◽

2012 ◽

Vol 83 (2) ◽

pp. 02A325 ◽

Author(s):

A. V. Vodopyanov ◽

I. V. Izotov ◽

D. A. Mansfeld ◽

G. Yu. Yushkov

Keyword(s):

Millimeter Waves ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Heating

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Electromagnetic pulse self-compression under cyclotron resonance absorption by plasma or electron beam

35th International Conference on Infrared, Millimeter, and Terahertz Waves ◽

10.1109/icimw.2010.5612332 ◽

2010 ◽

Author(s):

Naum S. Ginzburg ◽

Irina V. Zotova ◽

Alexander S. Sergeev

Keyword(s):

Electron Beam ◽

Cyclotron Resonance ◽

Electromagnetic Pulse ◽

Resonance Absorption

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Repelling of electron beam with local electron cyclotron resonance

Physics Letters A ◽

10.1016/0375-9601(70)90326-9 ◽

1970 ◽

Vol 32 (4) ◽

pp. 283-284

Author(s):

M. Sugawa ◽

H. Abe ◽

Y. Terumichi ◽

S. Tanaka

Keyword(s):

Electron Beam ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

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Trapping of positive ions in the electron beam of an ion cyclotron resonance spectrometer

International Journal of Mass Spectrometry and Ion Physics ◽

10.1016/0020-7381(78)80003-5 ◽

1978 ◽

Vol 26 (1) ◽

pp. 39-47 ◽

Author(s):

B.S. Freiser

Keyword(s):

Electron Beam ◽

Cyclotron Resonance ◽

Ion Cyclotron Resonance ◽

Positive Ions ◽

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Electron beam potential depression as an ion trap in Fourier transform ion cyclotron resonance mass spectrometry

International Journal of Mass Spectrometry and Ion Processes ◽

10.1016/0168-1176(94)04105-g ◽

1995 ◽

Vol 141 (2) ◽

pp. 161-170 ◽

Author(s):

Christopher L. Hendrickson ◽

Fawzi Hadjarab ◽

David A. Laude

Keyword(s):

Mass Spectrometry ◽

Fourier Transform ◽

Electron Beam ◽

Cyclotron Resonance ◽

Ion Trap ◽

Ion Cyclotron Resonance ◽

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