New in situ electron beam patterning process for GaAs using an electron-cyclotron-resonance plasma-oxidized mask and Cl2 gas etching

1992 ◽  
Vol 10 (6) ◽  
pp. 2711 ◽  
Author(s):  
N. Takado
Keyword(s):  
Electron Beam ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Electron Cyclotron ◽  
Electron Cyclotron Resonance Plasma ◽  
Electron Beam Patterning ◽  
Resonance Plasma

Characterization and in situ monitoring of a novel compact electron cyclotron resonance plasma source

1995 ◽  
Vol 66 (11) ◽  
pp. 5252-5256 ◽  
Author(s):  
Patrick O’Keeffe ◽  
C. O’Morain ◽  
S. Den ◽  
Y. Hayashi ◽  
S. Komuro ◽  
...  
Keyword(s):  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Plasma Source ◽  
Electron Cyclotron ◽  
In Situ Monitoring ◽  
Electron Cyclotron Resonance Plasma ◽  
Resonance Plasma
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