Solving for Thermal History and Metallurgical Condition of a Quenched and Aged Aluminum Alloy through Conductivity and Hardness Properties

Author(s):  
Russell A. Chihoski
2018 ◽  
Vol 60 (12) ◽  
pp. 1184-1190
Author(s):  
Muthunadar Selvaraj ◽  
Koteswara Rao ◽  
Gurusamy Selvakumar ◽  
Vela Murali

Author(s):  
G. G. Shaw

The morphology and composition of the fiber-matrix interface can best be studied by transmission electron microscopy and electron diffraction. For some composites satisfactory samples can be prepared by electropolishing. For others such as aluminum alloy-boron composites ion erosion is necessary.When one wishes to examine a specimen with the electron beam perpendicular to the fiber, preparation is as follows: A 1/8 in. disk is cut from the sample with a cylindrical tool by spark machining. Thin slices, 5 mils thick, containing one row of fibers, are then, spark-machined from the disk. After spark machining, the slice is carefully polished with diamond paste until the row of fibers is exposed on each side, as shown in Figure 1.In the case where examination is desired with the electron beam parallel to the fiber, preparation is as follows: Experimental composites are usually 50 mils or less in thickness so an auxiliary holder is necessary during ion milling and for easy transfer to the electron microscope. This holder is pure aluminum sheet, 3 mils thick.


Author(s):  
J. R. Michael ◽  
A. D. Romig ◽  
D. R. Frear

Al with additions of Cu is commonly used as the conductor metallizations for integrated circuits, the Cu being added since it improves resistance to electromigration failure. As linewidths decrease to submicrometer dimensions, the current density carried by the interconnect increases dramatically and the probability of electromigration failure increases. To increase the robustness of the interconnect lines to this failure mode, an understanding of the mechanism by which Cu improves resistance to electromigration is needed. A number of theories have been proposed to account for role of Cu on electromigration behavior and many of the theories are dependent of the elemental Cu distribution in the interconnect line. However, there is an incomplete understanding of the distribution of Cu within the Al interconnect as a function of thermal history. In order to understand the role of Cu in reducing electromigration failures better, it is important to characterize the Cu distribution within the microstructure of the Al-Cu metallization.


2015 ◽  
Vol 30 (6) ◽  
pp. 627
Author(s):  
YE Zuo-Yan ◽  
LIU Dao-Xin ◽  
LI Chong-Yang ◽  
ZHANG Xiao-Hua ◽  
ZANG Xiao-Ming ◽  
...  

Equipment ◽  
2006 ◽  
Author(s):  
S. R. Carvalho ◽  
S. M. M. Lima e Silva ◽  
G. Guimaraes

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