Optimal Control of Temperature Gradient in a Large Size Magnetic Czochralski Silicon Crystal Growth by Response Surface Methodology

2006 ◽  
pp. 330-330 ◽  
Author(s):  
H. P. Yu ◽  
Y. K. Sui ◽  
J. Wang ◽  
X. L. Dai ◽  
G. P. An
Keyword(s):  
Optimal Control ◽  
Response Surface Methodology ◽  
Crystal Growth ◽  
Temperature Gradient ◽  
Response Surface ◽  
Silicon Crystal ◽  
Czochralski Silicon ◽  
Large Size

Measurement of temperature gradient in Czochralski silicon crystal growth

2001 ◽  
Vol 229 (1-4) ◽  
pp. 6-10 ◽  
Author(s):  
Xinming Huang ◽  
Toshinori Taishi ◽  
Tiefeng Wang ◽  
Keigo Hoshikawa
Keyword(s):  
Crystal Growth ◽  
Temperature Gradient ◽  
Silicon Crystal ◽  
Czochralski Silicon

Investigation of nitrogen behaviors during Czochralski silicon crystal growth

2011 ◽  
Vol 318 (1) ◽  
pp. 178-182 ◽  
Author(s):  
Xuegong Yu ◽  
Deren Yang ◽  
Keigo Hoshikawa
Keyword(s):  
Crystal Growth ◽  
Silicon Crystal ◽  
Czochralski Silicon
Sign in / Sign up

Export Citation Format

Share Document