Diamond-Like Carbon Thin Films Deposition on Glass Using an Electron Cyclotron Resonance (ECR) Microwave Chemical Vapor Deposition (CVD) System

Advanced Tribology ◽

10.1007/978-3-642-03653-8_270 ◽

2009 ◽

pp. 816-819

Author(s):

Guangan Zhang ◽

Liping Wang ◽

Pengxun Yan ◽

Junyan Zhang

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Diamond Like Carbon ◽

Carbon Thin Films

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Electron Cyclotron Resonance Plasma Sources and Their Use in Plasma-Assisted Chemical Vapor Deposition of Thin Films

Physics of Thin Films - Plasma Sources for Thin Film Deposition and Etching ◽

10.1016/b978-0-08-092513-4.50007-6 ◽

1994 ◽

pp. 121-233 ◽

Author(s):

OLEG A. POPOV

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Sources ◽

Resonance Plasma

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Effect of microwave power on diamond-like carbon films deposited using electron cyclotron resonance chemical vapor deposition

Diamond and Related Materials ◽

10.1016/s0925-9635(00)00360-5 ◽

2000 ◽

Vol 9 (12) ◽

pp. 2024-2030 ◽

Author(s):

S.F. Yoon ◽

K.H. Tan ◽

J. Rusli ◽

Ahn ◽

Q.F. Huang

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Power ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Carbon Films ◽

Electron Cyclotron ◽

Diamond Like Carbon

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Preparation of ZnF2 and ZnF2–BaF2 thin films by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(99)00716-6 ◽

2000 ◽

Vol 358 (1-2) ◽

pp. 99-103 ◽

Author(s):

Masanori Shojiya ◽

Yoji Kawamoto ◽

Akio Konishi ◽

Hajimu Wakabayashi

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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I‐Vcharacteristics of electron‐cyclotron‐resonance plasma‐enhanced chemical‐vapor‐deposition silicon nitride thin films

Journal of Applied Physics ◽

10.1063/1.356455 ◽

1994 ◽

Vol 75 (2) ◽

pp. 979-984 ◽

Author(s):

Yoo‐Chan Jeon ◽

Ho‐Young Lee ◽

Seung‐Ki Joo

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Deposition of diamond-like carbon films using the screen grid method in electron cyclotron resonance chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581560 ◽

1999 ◽

Vol 17 (1) ◽

pp. 121-124 ◽

Author(s):

S. F. Yoon ◽

Rusli ◽

J. Ahn ◽

Q. Zhang ◽

Y. S. Wu ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Grid Method ◽

Carbon Films ◽

Electron Cyclotron ◽

Diamond Like Carbon ◽

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Biased Electron Cyclotron Resonance Chemical-Vapor Deposition of Silicon Dioxide Inter-Metal Dielectric Thin Films

Materials Science Forum ◽

10.4028/www.scientific.net/msf.140-142.255 ◽

1993 ◽

Vol 140-142 ◽

pp. 255-268 ◽

Author(s):

P. Shufflebotham ◽

M. Weise ◽

D. Pirkle ◽

D. Denison

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Dioxide ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Dielectric Thin Films

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Nanocrystalline Silicon Thin Films Fabricated at 80°C by Using Electron Cyclotron Resonance Chemical Vapor Deposition

Plasma Science and Technology ◽

10.1088/1009-0630/12/5/19 ◽

2010 ◽

Vol 12 (5) ◽

pp. 608-613 ◽

Author(s):

I. Y. Y Bu ◽

A. J Flewitt ◽

W. I Miline

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Electron Cyclotron ◽

Silicon Thin Films

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Dielectric properties of molybdenum-containing diamond-like carbon films deposited using electron cyclotron resonance chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(02)00049-4 ◽

2002 ◽

Vol 409 (2) ◽

pp. 211-219 ◽

Author(s):

Q.F. Huang ◽

S.F. Yoon ◽

Rusli ◽

Q. Zhang ◽

J. Ahn

Keyword(s):

Chemical Vapor Deposition ◽

Dielectric Properties ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Carbon Films ◽

Electron Cyclotron ◽

Diamond Like Carbon

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The origin of intrinsic stress and its relaxation for SiOF thin films deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(00)01399-7 ◽

2000 ◽

Vol 379 (1-2) ◽

pp. 259-264 ◽

Author(s):

S.P. Kim ◽

S.K. Choi

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Intrinsic Stress ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Conduction mechanism in molybdenum-containing diamond-like carbon deposited using electron cyclotron resonance chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.1308102 ◽

2000 ◽

Vol 88 (7) ◽

pp. 4191 ◽

Author(s):

Q. F. Huang ◽

S. F. Yoon ◽

Rusli ◽

H. Yang ◽

B. Gan ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Conduction Mechanism ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Diamond Like Carbon

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