Structure Design of Large Travel One-Arm Bridge Type Z-Axis Nano-Positioning Stage

2015 ◽  
Vol 645-646 ◽  
pp. 1064-1071
Author(s):  
Wei Fan ◽  
Zhong Shen Li ◽  
Shao Yin Jiang
Keyword(s):  
Structure Design ◽  
System Structure ◽  
Scanning System ◽  
Positioning Stage ◽  
Ultra Precision ◽  
Bridge Type ◽  
Abbe Error ◽  
Designing Method ◽  
Scanning Motion ◽  
Control Accuracy

In some areas such as micro-mechanical, ultra-precision machining, nanotechnology, the high-precision positioning and very fine vertical scanning motion are needed urgently. Therefore, the Z-axis micro-displacement driving control technology has become the key technology in these areas. The piezoelectric ceramics actuator and stepper motor were integrated into hybrid linear actuator in Z-axis nanopositioning stage, and this can simplify the structure of the drive system. By calculating the gravity center of the vertical scanning system, and using single counterweight, a new one-arm bridge type structure was built. Appropriate tension and current sensors were also equipped in order to real-time monitor the drive status. It is feasible to balance the weight with this simplified system structure, and also guarantee the driving control accuracy of nanopositioning stage. Besides, in the structural design, the Abbe error can be reduced greatly by placing the stage center, grating ruler and displacement measurement centerline on the same line with grating reading head. The driving travel of nanopositioning stage is 150mm, and driving resolution is 1nm. The designing method introduced gives a scientific method and practical reference for the development of z-axis driving control system.

Nano-CMM stage with zero Abbe error and its error analysis

2013 ◽  
Vol 21 (3) ◽  
pp. 664-670
Author(s):  
黄强先 HUANG Qiang-xian ◽  
余夫领 YU Fu-ling ◽  
宫二敏 GONG Er-min ◽  
王晨晨 WANG Chen-chen ◽  
费业泰 FEI Ye-tai
Keyword(s):  
Error Analysis ◽  
Abbe Error

Development of Double Equipotential Ring Capacitance Sensor in Ultra-Precise Optical Measurement

2007 ◽  
Author(s):  
Jianhuan Zhang ◽  
Xuemin Gao ◽  
Xiaodong Yang
Keyword(s):  
Edge Effect ◽  
Optical System ◽  
Machine Tools ◽  
Measurement Accuracy ◽  
Optical Measurement ◽  
Optical Methods ◽  
Narrow Gap ◽  
Capacitance Sensor ◽  
Abbe Error ◽  
The Cost

Measurements based on all sorts of optical methods in mechanical engineering area had been extensively studied, and in these measurements, many sensors, such as capacitance, are often applied to detect the focusing displacement of objective. For improving the edge effect of the plate capacitance, an equipotential ring is applied. Following the Abbe rule, a plate capacitance sensor with double equipotential rings and a central hole is introduced. The axis of the optical system perforates through the hole of the sensor, thus no Abbe error occurs. If the capacitance sensor is manufactured with machine tools, the gap between the equipotential ring and the orbicular electrode can not be narrow enough, meanwhile, the assembly becomes difficulty. In order to get narrow gap as well as thin electrodes, PCB process is tried to make the capacitance electrodes, but the gap between the equipotential ring and the electrode can only be about 0.1mm. When MEMS technique is introduced, the gap can be about 2μm. Although the cost is by far the higher than that made with PCB, the linear error as well as the measurement accuracy can be promoted greatly. After the circuit is designed, test of the capacitance sensor made with MEMS is completed, and the result that linear error is less than 0.05% and the sensitivity is 1mV/nm is presented with displacement of 30μm.

scholarly journals A New Computational Model of Step Gauge Calibration Based on the Synthesis Technology of Multi-Path Laser Interferometers

2020 ◽  
Vol 10 (6) ◽  
pp. 2089 ◽  
Author(s):  
Guoying Ren ◽  
Xinghua Qu ◽  
Xiangjun Chen
Keyword(s):  
Computational Model ◽  
Measurement Accuracy ◽  
Developed Countries ◽  
Measurement Capability ◽  
Length Standard ◽  
Good Measurement ◽  
Calibration Accuracy ◽  
Abbe Error ◽  
The Mathematical Model ◽  
Laser Interferometers

A step gauge is a commonly used length standard for international comparison, and its calibration accuracy is often used as a sign to measure a country’s length Calibration and Measurement Capability (CMC). Based on this, some developed countries and developing countries all over the world have been carrying out the research of precision calibration technology for step gauge. On the basis of summarizing the current situation of step gauge calibration technology in other countries, this paper presents a new computational model of step gauge calibration based on the Synthesis Technology of Multi-Path Laser Interferometers (SMLI) and an auto-collimator, which can synthesize the three laser light paths into the measured centerline of step gauge. It is very important to obtain a good measurement accuracy for the step gauge, conformed to the Abbe principle, no matter where it is installed on the CMM measurement platform. In this paper, the development of the mathematical model, the data collection algorithms, data analysis techniques, and measurement uncertainty budgets are discussed. Finally, the experimental measurement is carried out and the measurement accuracy is verified to be effective. The results show that this method can effectively avoid the influence of Abbe error in length measurement, and significantly enhance the calibration accuracy of the step gauge.

Measurement of straightness without Abbe error using an enhanced differential plane mirror interferometer

2017 ◽  
Vol 56 (3) ◽  
pp. 607 ◽  
Author(s):  
Tao Jin ◽  
Hudong Ji ◽  
Wenmei Hou ◽  
Yanfen Le ◽  
Lu Shen
Keyword(s):  
Plane Mirror ◽  
Abbe Error

scholarly journals Development of an Abbe Error Free Micro Coordinate Measuring Machine

2016 ◽  
Vol 6 (4) ◽  
pp. 97 ◽  
Author(s):  
Qiangxian Huang ◽  
Kui Wu ◽  
Chenchen Wang ◽  
Ruijun Li ◽  
Kuang-Chao Fan ◽  
...  
Keyword(s):  
Coordinate Measuring Machine ◽  
Measuring Machine ◽  
Abbe Error

Yaw error correction of ultra-precision stage for scanning beam interference lithography systems

2018 ◽  
Vol 232 (7) ◽  
pp. 869-878
Author(s):  
Sen Lu ◽  
Kaiming Yang ◽  
Yu Zhu ◽  
Leijie Wang ◽  
Ming Zhang ◽  
...  
Keyword(s):  
Error Correction ◽  
Correction Function ◽  
Interference Lithography ◽  
Grating Fabrication ◽  
Scanning Beam ◽  
Key Factor ◽  
Ultra Precision ◽  
Dual Stage ◽  
Scanning Beam Interference Lithography ◽  
Abbe Error

The stage yaw error is a key factor affecting the phase distortion of gratings produced by scanning beam interference lithography system. In order to solve this problem, a coarse-fine dual-stage mechanism is proposed, in which an ultra-precision fine positioning stage with yaw error correction function is developed. To achieve nanoscale positioning and sub-microradian yaw motion accuracy, four Lorentz motors are used to drive the fine stage. The internal coupling factors and the mechanism of Lorentz motors motion control are analyzed. Besides, the Abbe error caused by the yaw error is investigated. Positioning and scanning experiments are conducted and the outcomes show that maximum yaw error is 0.33 μrad during constant velocity scanning, which completely meets the grating fabrication requirements.

Influence and Revising Method of Grating Ruling Engine′s Abbe Error on Quality of Grating Wavefront

2017 ◽  
Vol 44 (9) ◽  
pp. 0904001
Author(s):  
糜小涛 Mi Xiaotao ◽  
于海利 Yu Haili ◽  
于宏柱 Yu Hongzhu ◽  
齐向东 Qi Xiangdong ◽  
李晓天 Li Xiaotian ◽  
...  
Keyword(s):  
Abbe Error
Sign in / Sign up

Export Citation Format

Share Document