Characterization of thin alumina films prepared by metal-organic chemical vapour deposition (MOCVD) by high resolution SEM, (AR)XPS and AES depth profiling

1995 ◽  
Vol 353 (5-8) ◽  
pp. 707-712 ◽  
Author(s):  
W. Lisowski ◽  
A. H. J. van den Berg ◽  
M. Smithers ◽  
V. A. C. Haanappel
Keyword(s):  
High Resolution ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Depth Profiling ◽  
Organic Chemical ◽  
Alumina Films ◽  
Metal Organic

Structural and morphological characterization of the Cd-rich region in Cd1-xZnxO thin films grown by atmospheric pressure metal organic chemical vapour deposition

2019 ◽  
Vol 683 ◽  
pp. 128-134 ◽  
Author(s):  
Adelaida Huerta-Barberà ◽  
Esther de Prado ◽  
Maria del Carmen Martínez-Tomás ◽  
Saïd Agouram ◽  
Elias Muñoz ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Atmospheric Pressure ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Morphological Characterization ◽  
Organic Chemical ◽  
Rich Region ◽  
Metal Organic

scholarly journals The mechanical properties of thin alumina films deposited by metal-organic chemical vapour deposition

1995 ◽  
Vol 254 (1-2) ◽  
pp. 153-163 ◽  
Author(s):  
V.A.C. Haanappel ◽  
D.v.d. Vendel ◽  
H.S.C. Metselaar ◽  
H.D. van Corbach ◽  
T. Fransen ◽  
...  
Keyword(s):  
Mechanical Properties ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Organic Chemical ◽  
Alumina Films ◽  
Metal Organic
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