Thermal stability of amorphous carbon films deposited by pulsed laser ablation

Applied Physics A ◽

10.1007/s003390000618 ◽

2000 ◽

Vol 71 (4) ◽

pp. 433-439 ◽

Author(s):

S. Rey ◽

F. Antoni ◽

B. Prevot ◽

E. Fogarassy ◽

J.C. Arnault ◽

...

Keyword(s):

Thermal Stability ◽

Laser Ablation ◽

Amorphous Carbon ◽

Pulsed Laser ◽

Pulsed Laser Ablation ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Thermal Stability Of

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Visible photoluminescence from hydrogenated amorphous carbon films prepared by pulsed laser ablation of polymethyl methacrylate (PMMA)

Applied Physics A ◽

10.1007/s003390050379 ◽

1996 ◽

Vol 63 (3) ◽

pp. 243-246 ◽

Author(s):

Z. F. Li ◽

Z. Y. Yang ◽

R. F. Xiao

Keyword(s):

Laser Ablation ◽

Polymethyl Methacrylate ◽

Amorphous Carbon ◽

Pulsed Laser ◽

Pulsed Laser Ablation ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Hydrogenated Amorphous Carbon ◽

Visible Photoluminescence ◽

Hydrogenated Amorphous

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Optical properties of high-density amorphous carbon films grown by nanosecond and femtosecond pulsed laser ablation

Applied Physics A ◽

10.1007/s00339-005-3257-6 ◽

2005 ◽

Vol 81 (3) ◽

pp. 471-476 ◽

Author(s):

T. Katsuno ◽

C. Godet ◽

J.C. Orlianges ◽

A.S. Loir ◽

F. Garrelie ◽

...

Keyword(s):

Optical Properties ◽

Laser Ablation ◽

Amorphous Carbon ◽

Pulsed Laser ◽

Pulsed Laser Ablation ◽

Carbon Films ◽

High Density ◽

Amorphous Carbon Films ◽

Femtosecond Pulsed Laser

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Thermal stability of amorphous carbon films grown by pulsed laser deposition

Applied Physics Letters ◽

10.1063/1.115891 ◽

1996 ◽

Vol 68 (12) ◽

pp. 1643-1645 ◽

Author(s):

T. A. Friedmann ◽

K. F. McCarty ◽

J. C. Barbour ◽

M. P. Siegal ◽

Dean C. Dibble

Keyword(s):

Thermal Stability ◽

Pulsed Laser Deposition ◽

Amorphous Carbon ◽

Pulsed Laser ◽

Carbon Films ◽

Laser Deposition ◽

Amorphous Carbon Films ◽

Thermal Stability Of

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Structure and Haemocompatibility of Tetrahedral Amorphous Carbon Films Prepared by Pulsed Laser Ablation

Sensors and Materials ◽

10.18494/sam.2009.574 ◽

2009 ◽

pp. 373

Keyword(s):

Laser Ablation ◽

Amorphous Carbon ◽

Pulsed Laser ◽

Pulsed Laser Ablation ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Tetrahedral Amorphous Carbon

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Nitrogen doping and structural properties of amorphous carbon films deposited by pulsed laser ablation

Applied Surface Science ◽

10.1016/s0169-4332(02)00332-x ◽

2002 ◽

Vol 197-198 ◽

pp. 542-546 ◽

Author(s):

M Rusop ◽

S.M Mominuzzaman ◽

X.M Tian ◽

T Soga ◽

T Jimbo ◽

...

Keyword(s):

Laser Ablation ◽

Structural Properties ◽

Amorphous Carbon ◽

Nitrogen Doping ◽

Pulsed Laser ◽

Pulsed Laser Ablation ◽

Carbon Films ◽

Amorphous Carbon Films

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Visible photoluminescence from hydrogenated amorphous carbon films prepared by pulsed laser ablation of polymethyl methacrylate (PMMA)

Applied Physics A ◽

10.1007/bf01567876 ◽

1996 ◽

Vol 63 (3) ◽

pp. 243-246 ◽

Author(s):

Z. F. Li ◽

Z. Y. Yang ◽

R. F. Xiao

Keyword(s):

Laser Ablation ◽

Polymethyl Methacrylate ◽

Amorphous Carbon ◽

Pulsed Laser ◽

Pulsed Laser Ablation ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Hydrogenated Amorphous Carbon ◽

Visible Photoluminescence ◽

Hydrogenated Amorphous

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Thermal Stability of Tetrahedral Amorphous Carbon Films Fabricated by Filtered Cathodic Arc Technique

Journal of Inorganic Materials ◽

10.3724/sp.j.1077.2008.00789 ◽

2008 ◽

Vol 23 (4) ◽

pp. 789-793

Author(s):

Li-Zhao QIN

Keyword(s):

Thermal Stability ◽

Amorphous Carbon ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Tetrahedral Amorphous Carbon ◽

Cathodic Arc ◽

Thermal Stability Of

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Effects and thermal stability of hydrogen microwave plasma treatment on tetrahedral amorphous carbon films by in situ ultraviolet photoelectron spectroscopy

Journal of Applied Physics ◽

10.1063/1.3156689 ◽

2009 ◽

Vol 106 (2) ◽

pp. 024901 ◽

Author(s):

Daniel H. C. Chua ◽

Jovan Hsieh ◽

Xingyu Gao ◽

Dongchen Qi ◽

Shi Chen ◽

...

Keyword(s):

Thermal Stability ◽

Amorphous Carbon ◽

Photoelectron Spectroscopy ◽

Microwave Plasma ◽

Carbon Films ◽

Ultraviolet Photoelectron Spectroscopy ◽

Amorphous Carbon Films ◽

Tetrahedral Amorphous Carbon ◽

Thermal Stability Of

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Deposition temperature effect on thermal stability of fluorinated amorphous carbon films utilized as low-K dielectrics

Materials Science in Semiconductor Processing ◽

10.1016/s1369-8001(00)00096-2 ◽

2001 ◽

Vol 4 (4) ◽

pp. 383-391 ◽

Author(s):

N. Ariel ◽

M. Eizenberg ◽

Y. Wang ◽

S.P. Murarka

Keyword(s):

Thermal Stability ◽

Temperature Effect ◽

Amorphous Carbon ◽

Deposition Temperature ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Low K ◽

Thermal Stability Of

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Improvement of the thermal stability of amorphous carbon films by incorporation of nitrogen

Thin Solid Films ◽

10.1016/s0040-6090(99)00421-6 ◽

1999 ◽

Vol 353 (1-2) ◽

pp. 157-165 ◽

Author(s):

H.L. Bai ◽

E.Y. Jiang

Keyword(s):

Thermal Stability ◽

Amorphous Carbon ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Thermal Stability Of

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