Deposition temperature effect on thermal stability of fluorinated amorphous carbon films utilized as low-K dielectrics

2001 ◽  
Vol 4 (4) ◽  
pp. 383-391 ◽  
Author(s):  
N. Ariel ◽  
M. Eizenberg ◽  
Y. Wang ◽  
S.P. Murarka
Keyword(s):  
Thermal Stability ◽  
Temperature Effect ◽  
Amorphous Carbon ◽  
Deposition Temperature ◽  
Carbon Films ◽  
Amorphous Carbon Films ◽  
Low K ◽  
Thermal Stability Of

Thermal stability of amorphous carbon films grown by pulsed laser deposition

1996 ◽  
Vol 68 (12) ◽  
pp. 1643-1645 ◽  
Author(s):  
T. A. Friedmann ◽  
K. F. McCarty ◽  
J. C. Barbour ◽  
M. P. Siegal ◽  
Dean C. Dibble
Keyword(s):  
Thermal Stability ◽  
Pulsed Laser Deposition ◽  
Amorphous Carbon ◽  
Pulsed Laser ◽  
Carbon Films ◽  
Laser Deposition ◽  
Amorphous Carbon Films ◽  
Thermal Stability Of

Effect of nitrogen addition on the properties and thermal stability of fluorinated amorphous carbon films

2006 ◽  
Vol 510 (1-2) ◽  
pp. 125-133 ◽  
Author(s):  
Chia-Han Lai ◽  
Wei-Shun Lai ◽  
Hua-Chun Chiue ◽  
Hung-Jen Chen ◽  
Shou-Yi Chang ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Amorphous Carbon ◽  
Nitrogen Addition ◽  
Carbon Films ◽  
Amorphous Carbon Films ◽  
Thermal Stability Of

Thermal stability of amorphous carbon films deposited by pulsed laser ablation

2000 ◽  
Vol 71 (4) ◽  
pp. 433-439 ◽  
Author(s):  
S. Rey ◽  
F. Antoni ◽  
B. Prevot ◽  
E. Fogarassy ◽  
J.C. Arnault ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Laser Ablation ◽  
Amorphous Carbon ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Carbon Films ◽  
Amorphous Carbon Films ◽  
Thermal Stability Of

Chemical and Thermal Stability of Fluorinated Amorphous Carbon Films for Interlayer Dielectric Applications

1999 ◽  
Vol 565 ◽  
Author(s):  
J. P. Chang ◽  
H. W. Krautter ◽  
W. Zhu ◽  
R. L. Opila ◽  
C. S. Pai
Keyword(s):  
Amorphous Carbon ◽  
Fluorine Content ◽  
Carbon Films ◽  
Tantalum Nitride ◽  
Fluorine Concentration ◽  
Interlayer Dielectric ◽  
Amorphous Carbon Films ◽  
Chemical States ◽  
Low K ◽  
Thermal Stability Of

AbstractThe thermal and chemical stability of low k fluorinated amorphous carbon (a-C:F) material, deposited by a novel co-sputtering process using both polytetrafluoroethylene (PTFE) and graphite targets was investigated. Thin films of a-C:F with fluorine concentration of 2–55% were deposited, and carbon is observed by XPS in four distinct chemical states, C-C, C-F, C-F2, C-F 3. The relative intensity of C-Fx to C-C increased in intensity with increasing fluorine content and decreasing deposition temperature. Formation of tantalum fluoride was observed upon deposition of tantalum nitride, and the defluorination of the film could lead to reliability and delamination problems.

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