Temperature and pH dual-responsive behavior of polyhedral oligomeric silsesquioxane-based star-block copolymer with poly(acrylic acid-block-N-isopropylacrylamide) as arms

2011 ◽  
Vol 290 (6) ◽  
pp. 507-515 ◽  
Author(s):  
Yu Bai ◽  
Jia Wei ◽  
Liping Yang ◽  
Chaobin He ◽  
Xuehong Lu
Keyword(s):  
Block Copolymer ◽  
Acrylic Acid ◽  
Polyhedral Oligomeric Silsesquioxane ◽  
Star Block Copolymer ◽  
Dual Responsive ◽  
Responsive Behavior ◽  
Oligomeric Silsesquioxane ◽  
Poly Acrylic Acid

Telechelic Hybrid Poly(acrylic acid)s Containing Polyhedral Oligomeric Silsesquioxane (POSS) and Their Self-Assembly in Water

2011 ◽  
Vol 44 (17) ◽  
pp. 6891-6898 ◽  
Author(s):  
Weian Zhang ◽  
Jiayin Yuan ◽  
Stephan Weiss ◽  
Xiaodong Ye ◽  
Chunliang Li ◽  
...  
Keyword(s):  
Acrylic Acid ◽  
Self Assembly ◽  
Polyhedral Oligomeric Silsesquioxane ◽  
Oligomeric Silsesquioxane ◽  
Poly Acrylic Acid

CO2-Triggered and temperature-switchable crystallization-driven self-assembly of a semicrystalline block copolymer in aqueous medium

2019 ◽  
Vol 10 (46) ◽  
pp. 6305-6314
Author(s):  
Rui Zhu ◽  
Xinjie Luo ◽  
Yujun Feng ◽  
Laurent Billon
Keyword(s):  
Block Copolymer ◽  
Acrylic Acid ◽  
Aqueous Medium ◽  
Self Assembly ◽  
Pure Block ◽  
Random Block ◽  
Nitroxide Mediated Polymerization ◽  
Poly Acrylic Acid

The synthesis of a semicrystalline block copolymer comprising a hydrophilic poly(acrylic acid) pure block and an amphiphilic poly(acrylic acid)-r-poly(octadecyl acrylate) random block by nitroxide-mediated polymerization is reported.

RAFT Polymerization of 1-Ethoxyethyl Acrylate:  A Novel Route toward Near-Monodisperse Poly(acrylic acid) and Derived Block Copolymer Structures

2005 ◽  
Vol 38 (18) ◽  
pp. 7653-7659 ◽  
Author(s):  
Richard Hoogenboom ◽  
Ulrich S. Schubert ◽  
Wim Van Camp ◽  
Filip E. Du Prez
Keyword(s):  
Block Copolymer ◽  
Acrylic Acid ◽  
Raft Polymerization ◽  
Poly Acrylic Acid

Dual Patterning of a Poly(acrylic acid) Layer by Electron-Beam and Block Copolymer Lithographies

Langmuir ◽  
2013 ◽  
Vol 29 (24) ◽  
pp. 7433-7438 ◽  
Author(s):  
Anthony C. Pearson ◽  
Matthew R. Linford ◽  
John N. Harb ◽  
Robert C. Davis
Keyword(s):  
Electron Beam ◽  
Block Copolymer ◽  
Acrylic Acid ◽  
Poly Acrylic Acid

Poly(styrene-b-butadiene-b-styrene)-Dye-Coupled Polyhedral Oligomeric Silsesquioxanes

2010 ◽  
Vol 123-125 ◽  
pp. 169-172
Author(s):  
Steven Spoljaric ◽  
Robert A. Shanks
Keyword(s):  
Mechanical Properties ◽  
Thermal Stability ◽  
Block Copolymer ◽  
Exponential Function ◽  
Polyhedral Oligomeric Silsesquioxane ◽  
Element Model ◽  
Polyhedral Oligomeric Silsesquioxanes ◽  
Creep And Recovery ◽  
Oligomeric Silsesquioxane ◽  
Colour Coordinates

Dye-coupled polyhedral oligomeric silsesquioxane (POSS) were prepared and the coloured POSS particles were ultrasonically solution dispersed in poly(styrene-b-butadiene-b-styrene) (SBS). POSS molecules contained either isobutyl or phenyl groups to provide selective compatibility with either the soft (butadiene) or hard (styrene) phase within the block copolymer. The composition and thermal stability were characterised using thermogravimetry. Colour coordinates were measured. Tensile mechanical properties, creep and recovery were determined. Creep was modeled using the 4-element model of Maxwell and Kelvin-Voigt, while recovery correlated with the stretched-exponential function of Kohlrausch, Williams and Watts.

Sign in / Sign up

Export Citation Format

Share Document