The effects of SiC whiskers and an SiC film coating deposited by chemical vapor infiltration (CVI) on a porous cordierite substrate

2008 ◽  
Vol 43 (16) ◽  
pp. 5574-5578 ◽  
Author(s):  
Hwan-Sup Lee ◽  
Jun-Gyu Kim ◽  
Doo-Jin Choi
2020 ◽  
Vol 46 (5) ◽  
pp. 6234-6242 ◽  
Author(s):  
Huiwen Xiong ◽  
Hehao Chen ◽  
Zhaoke Chen ◽  
Xiang Xiong ◽  
Dou Zhang ◽  
...  

2012 ◽  
Vol 512-515 ◽  
pp. 789-792
Author(s):  
Fan Tao Meng ◽  
Shan Yi Du ◽  
Yu Min Zhang

Chemical vapor deposition (CVD) is an effective method of preparing silicon carbide whiskers or films and chemical vapor infiltration (CVI) can be successfully used as the preparation of SiC composites. In this paper, silicon carbides whiskers were firstly deposited on substrates of RB-SiC by CVD process and then silicon carbide composites were prepared by chemical vapor infiltration in the SiC whiskers in an upright chemical vapor deposition furnace of Φ150mm×450mm with methyltrichloride silicane (MTS) as precursor gas, H2 as carrier gas and Ar as dilute gas. The morphologies of the SiC whiskers grown on RB-SiC substrate and SiC composites infiltrated in SiC whiskers were determined by scanning electron microscope (SEM), and the crystalline phase of the final deposits were confirmed with X-ray diffractometry (XRD) As a result, the curly defects of whiskers decrease with the addition of dilute gas. And by chemical vapor infiltration in SiC whiskers the, SiC composites were successfully prepared. Finally the deposits were determined as β-SiC.


2016 ◽  
Vol 31 (3) ◽  
pp. 298
Author(s):  
TANG Zhe-Peng ◽  
ZHANG Zhong-Wei ◽  
FANG Jin-Ming ◽  
PENG Yu-Qing ◽  
LI Ai-Jun ◽  
...  

2009 ◽  
Vol 24 (5) ◽  
pp. 939-942 ◽  
Author(s):  
Zhi-Xin MENG ◽  
Lai-Fei CHENG ◽  
Li-Tong ZHANG ◽  
Yong-Dong XU ◽  
Xiu-Feng HAN

2015 ◽  
Vol 109 ◽  
pp. 381-389 ◽  
Author(s):  
M. Albano ◽  
R. Pastore ◽  
A. Delfini ◽  
D. Micheli ◽  
F. Volpini ◽  
...  

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