Effect of annealing temperature on the structural, morphological, optical and electrical properties of Co3O4 thin film by nebulizer spray pyrolysis technique

2015 ◽  
Vol 27 (4) ◽  
pp. 3860-3866 ◽  
Author(s):  
R. Manogowri ◽  
R. Mary Mathelane ◽  
S. Valanarasu ◽  
I. Kulandaisamy ◽  
A. Benazir Fathima ◽  
...  
Keyword(s):  
Thin Film ◽  
Electrical Properties ◽  
Spray Pyrolysis ◽  
Annealing Temperature ◽  
Spray Pyrolysis Technique ◽  
Optical And Electrical Properties ◽  
Nebulizer Spray Pyrolysis ◽  
Nebulizer Spray

Fabrication of strontium included hafnium oxide thin film based Al/Sr:HfO2/n-Si MIS-Schottky barrier diodes for tuned electrical behavior

2021 ◽  
Author(s):  
Harishsenthil Perumal ◽  
J. Chandrasekaran ◽  
Dheivasigamani Thangaraju ◽  
Balasubramani Vellingri
Keyword(s):  
Thin Film ◽  
Spray Pyrolysis ◽  
Hafnium Oxide ◽  
Spray Pyrolysis Technique ◽  
Growth Behavior ◽  
Oxide Thin Film ◽  
Electrical Behavior ◽  
Nebulizer Spray Pyrolysis ◽  
Jet Nebulizer ◽  
Nebulizer Spray

Growth behavior of pure and Sr included HfO2 composite thin film for the different concentrations of Sr (5, 10, and 15 Wt.%) through the Jet Nebulizer Spray Pyrolysis technique were...

scholarly journals Effect of Temperature on the Properties of Nickel Sulfide Films Performed by Spray Pyrolysis Technique

2020 ◽  
Vol 20 (3) ◽  
pp. 36-51
Author(s):  
A. Gahtar ◽  
S. Benramache ◽  
C. Zaouche ◽  
A. Boukacham ◽  
A. Sayah
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Electrical Properties ◽  
Spray Pyrolysis ◽  
Nickel Sulfide ◽  
Spray Pyrolysis Technique ◽  
Hexagonal Structure ◽  
Effect Of Temperature ◽  
Optical And Electrical Properties ◽  
Xrd Diffraction

AbstractIn this work, we have prepared new materials of the nickel sulfide thin films by using the spray pyrolysis technique for promising co-catalyst to improve the photocatalytic performance or superconductivity. The effect of deposition temperature (523, 573 and 623 K) on structural, optical and electrical properties was investigated. The XRD diffraction shows that the prepared nickel sulfide at 523, 573 and 623 K having an orthorhombic, hexagonal and hexagonal structure, which were Ni3S2, Ni17S18 and NiS2, respectively. The minimum value of crystallite size (45,9 nm) was measured of deposited film at 573K. The thin films prepared at 523 and 573 K have an average transmittance is about 20 %. The prepared Ni1S2 thin film at T=623 K has the lowest calculated optical band gap and Urbach energy. The Ni1S2 thin film also has the best calculated of the refractive index and the extinction coefficient. The FTIR spectrums of the nickel sulfide have various bands such as Ni-S, C-H, O-H, N–H and C-S. The maximum electrical conductivity is 4,29x105 (Ω.cm)−1 was obtained at 573K of the Ni17S18. The nickel sulfide thin films sprayed at 573K have good structural, optical and electrical properties.

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