Mathematical Simulation of a High-Frequency Low-Pressure Discharge with Gas Injection in Non-Local Approximation: Electro- and Plasmadynamics

Author(s):  
A. Yu. Shemakhin ◽  
V. S. Zheltukhin ◽  
E. Yu. Shemakhin
Author(s):  
Nuttee Thungsuk ◽  
Toshifumi Yuji ◽  
Narong Mungkung ◽  
Yoshimi Okamura ◽  
Atsushi Fujimaru ◽  
...  

AbstractThe low-pressure high-frequency plasma chemical vapor deposition (CVD) system was developed with non-thermal plasma process to study the Polyethylene naphthalate (PEN) surface characteristics. Plasma surface treatment by oxygen can improve the adhesive properties. A mixture of Ar and O


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