The Development of Polyethylene Naphthalate Films by Low-pressure High-frequency Plasma Chemical Vapor Deposition System with Advance Oxidations Process

2015 ◽  
Vol 18 (1) ◽  
Author(s):  
Nuttee Thungsuk ◽  
Toshifumi Yuji ◽  
Narong Mungkung ◽  
Yoshimi Okamura ◽  
Atsushi Fujimaru ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
High Frequency ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Polyethylene Naphthalate ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
High Frequency Plasma ◽  
Frequency Plasma

AbstractThe low-pressure high-frequency plasma chemical vapor deposition (CVD) system was developed with non-thermal plasma process to study the Polyethylene naphthalate (PEN) surface characteristics. Plasma surface treatment by oxygen can improve the adhesive properties. A mixture of Ar and O

An Analysis of Low-Pressure High-Frequency Plasma Chemical Vapor Deposition System for Flexible Solar Cell Characteristics

2015 ◽  
Vol 749 ◽  
pp. 121-125
Author(s):  
Nuttee Thungsuk ◽  
Toshifumi Yuji ◽  
Nat Kasayapan ◽  
Chirapas Mahawan ◽  
Somchai Arunrungrusmi ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
High Frequency ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Polyethylene Naphthalate ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
High Frequency Plasma ◽  
Frequency Plasma

The flexible dye-sensitized solar cells have a need to improve adhesive property in each layer in order to increase efficiency of this solar cell. Flexible surface with Polyethylene naphthalate (PEN) were modified by using surface treatment from developed the low-pressure high-frequency Plasma Chemical Vapor Deposition system in order to improve adhesive characteristic. The oxygen plasma treatment can improve adhesive property of Polyethylene naphthalate (PEN) films and also cleaning surface. We were using the mixture of Ar and O2 gas for plasma treatment with oxygen gas flow rate from 0.1 L/min. to 0.5 L/min. while Ar gas flow rate was set at 10 L/min. and 5 minute for treatment time. The results indicate that using low-pressure high-frequency Plasma Chemical Vapor Deposition system can be possible improvement adhesive characteristic of PEN films with radical increased on films.

PEN Film Surface Development Using High-Frequency - Low Pressure Plasma Chemical Vapor Deposition System

2014 ◽  
Vol 704 ◽  
pp. 58-62
Author(s):  
Peerapong Nuchuay ◽  
Nuttee Thungsuk ◽  
Tanapoj Chaikeeree ◽  
Toshifumi Yuji ◽  
Nat Kasayapan ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Solar Cell ◽  
Vapor Deposition ◽  
High Frequency ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Film Material ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Surface Development

Solar cell converts sunlight into electricity with no moving parts and environmental friendly. Although silicon based solar cell is currently more efficient, the dye-sensitized solar cell is considerably cheaper to manufacture because of its low cost materials and simplicity process of fabrication. In this paper, the development of plasma formed equipment for thin film material on flexible solar cell using low-pressure high frequency Plasma Chemical Vapor Deposition method on the surface of Polyethylene naphthalate (PEN) with the mixture of Ar gas and N2gas is presented. The results indicate that using this method can be possible for surface modification.

High-Performance SiOF Film Fabricated Using a Dual-Frequency-Plasma Chemical Vapor Deposition system

2004 ◽  
Vol 43 (9A) ◽  
pp. 5984-5989 ◽  
Author(s):  
Takashi Yoda ◽  
Keiji Fujita ◽  
Hideshi Miyajima ◽  
Rempei Nakata ◽  
Yukio Nishiyama ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
High Performance ◽  
Chemical Vapor ◽  
Dual Frequency ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Frequency Plasma
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