Plasma-assisted filling electron beam lithography for high throughput patterning of large area closed polygon nanostructures

Nanoscale ◽  
2020 ◽  
Vol 12 (19) ◽  
pp. 10584-10591 ◽  
Author(s):  
You Sin Tan ◽  
Hailong Liu ◽  
Qifeng Ruan ◽  
Hao Wang ◽  
Joel K. W. Yang
Keyword(s):  
Electron Beam ◽  
Plasma Treatment ◽  
High Throughput ◽  
Electron Beam Lithography ◽  
Large Area ◽  
Post Exposure ◽  
Closed Polygon

The PFEBL process allows enhancement of electron beam writing efficiency for patterning of closed polygon structures using a post-exposure plasma treatment.

Electron-beam lithography with character projection technique for high-throughput exposure with line-edge quality control

2016 ◽  
Vol 15 (3) ◽  
pp. 031606 ◽  
Author(s):  
Rimon Ikeno ◽  
Satoshi Maruyama ◽  
Yoshio Mita ◽  
Makoto Ikeda ◽  
Kunihiro Asada
Keyword(s):  
Quality Control ◽  
Electron Beam ◽  
High Throughput ◽  
Electron Beam Lithography ◽  
Projection Technique ◽  
Edge Quality

High-throughput projection electron-beam lithography employing SCALPEL

1993 ◽  
Author(s):  
James A. Liddle ◽  
Steven D. Berger
Keyword(s):  
Electron Beam ◽  
High Throughput ◽  
Electron Beam Lithography

21120 Plasmon-Assisted Field emitter Array for High Throughput Electron Beam Lithography

2014 ◽  
Vol 2014.20 (0) ◽  
pp. _21120-1_-_21120-2_
Author(s):  
Takahiro OKANO ◽  
Kentaro IWAMI ◽  
Norihiro UMEDA
Keyword(s):  
Electron Beam ◽  
High Throughput ◽  
Electron Beam Lithography ◽  
Field Emitter ◽  
Emitter Array ◽  
Field Emitter Array

Reflective electron-beam lithography: progress toward high-throughput production capability

2012 ◽  
Author(s):  
Regina Freed ◽  
Thomas Gubiotti ◽  
Jeff Sun ◽  
Francoise Kidwingira ◽  
Jason Yang ◽  
...  
Keyword(s):  
Electron Beam ◽  
High Throughput ◽  
Electron Beam Lithography ◽  
Production Capability

Large area mold fabrication for the nanoimprint lithography using electron beam lithography

2010 ◽  
Vol 53 (1) ◽  
pp. 248-252 ◽  
Author(s):  
JinKui Chu ◽  
FanTao Meng ◽  
ZhiTao Han ◽  
Qing Guo
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Nanoimprint Lithography ◽  
Large Area ◽  
Mold Fabrication
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