Etching of As- and P-based III–V semiconductors in a planar inductively coupled BCl3/Ar plasma
2004 ◽
Vol 33
(4)
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pp. 358-363
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2004 ◽
Vol 22
(5)
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pp. 2101-2106
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2003 ◽
Vol 16
(5)
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pp. 378-384
2020 ◽
Vol 109
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pp. 104929
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2003 ◽
Vol 21
(6)
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pp. 1837-1842
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