Elastic modulus measurement of thin film using a dynamic method

1997 ◽  
Vol 26 (9) ◽  
pp. 1002-1008 ◽  
Author(s):  
Youngman Kim
Keyword(s):  
Thin Film ◽  
Elastic Modulus ◽  
Dynamic Method ◽  
Modulus Measurement

scholarly journals A harmless thin film elastic modulus measurement method through bending the nonlinear sliding cantilever beam

Measurement ◽  
2021 ◽  
Vol 175 ◽  
pp. 108984
Author(s):  
Jianhua Tang ◽  
Lezhang Liu ◽  
Li Jiang ◽  
Hui Huang ◽  
Qiongyao Wang
Keyword(s):  
Thin Film ◽  
Elastic Modulus ◽  
Cantilever Beam ◽  
Measurement Method ◽  
Modulus Measurement

scholarly journals The Effects of Creep on Elastic Modulus Measurement Using Nanoindentation

2000 ◽  
Vol 649 ◽  
Author(s):  
G. Feng ◽  
A.H.W. Ngan
Keyword(s):  
Elastic Modulus ◽  
Elastic Deformation ◽  
Elastic Moduli ◽  
Holding Time ◽  
Time Dependent ◽  
Nanoindentation Test ◽  
Modification Method ◽  
Unloading Rate ◽  
Modulus Measurement

ABSTRACTDuring the unloading segment of nanoindentation, time dependent displacement (TDD) accompanies elastic deformation. Consequently the modulus calculated by the Oliver-Pharr scheme can be overestimated. In this paper we present evidences for the influence of the measured modulus by TDD. A modification method is also presented to correct for the effects of TDD by extrapolating the TDD law in the holding process to the beginning of the unloading process. Using this method, the appropriate holding time and unloading rate can be estimated for nanoindentation test to minimise the effects of TDD. The elastic moduli of three materials computed by the modification method are compared with the results without considering the TDD effects.

Growth, Structural and Mechanical Characterization and Reliability of Chemical Vapor Deposited Co and Co3O4 Thin Films as Candidate Materials for Sensing Applications

2011 ◽  
Vol 495 ◽  
pp. 108-111 ◽  
Author(s):  
Vasiliki P. Tsikourkitoudi ◽  
Elias P. Koumoulos ◽  
Nikolaos Papadopoulos ◽  
Costas A. Charitidis
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Elastic Modulus ◽  
Data Storage ◽  
Mechanical Stability ◽  
Chemical Vapor ◽  
Magnetic Sensors ◽  
Functional Coatings ◽  
Sensing Applications ◽  
Chemical Vapor Deposited

The adhesion and mechanical stability of thin film coatings on substrates is increasingly becoming a key issue in device reliability as magnetic and storage technology driven products demand smaller, thinner and more complex functional coatings. In the present study, chemical vapor deposited Co and Co3O4thin films on SiO2and Si substrates are produced, respectively. Chemical vapor deposition is the most widely used deposition technique which produces thin films well adherent to the substrate. Co and Co3O4thin films can be used in innovative applications such as magnetic sensors, data storage devices and protective layers. The produced thin films are characterized using nanoindentation technique and their nanomechanical properties (hardness and elastic modulus) are obtained. Finally, an evaluation of the reliability of each thin film (wear analysis) is performed using the hardness to elastic modulus ratio in correlation to the ratio of irreversible work to total work for a complete loading-unloading procedure.

scholarly journals Elastic modulus measurement of ultrathin layer using gas cluster ion beam

2021 ◽  
Vol 15 (6) ◽  
pp. JAMDSM0076-JAMDSM0076
Author(s):  
Hiroshi TANI ◽  
Renguo LU ◽  
Shinji KOGANEZAWA ◽  
Norio TAGAWA
Keyword(s):  
Elastic Modulus ◽  
Ion Beam ◽  
Cluster Ion ◽  
Modulus Measurement ◽  
Gas Cluster Ion Beam ◽  
Ultrathin Layer

scholarly journals Elastic modulus measurement of thermoplastic composites through modal analysis

2021 ◽  
Vol 1189 (1) ◽  
pp. 012020
Author(s):  
B Harshavardhan ◽  
R Ravishankar ◽  
B Suresha ◽  
U Arun C Dixit
Keyword(s):  
Elastic Modulus ◽  
Modal Analysis ◽  
Thermoplastic Composites ◽  
Modulus Measurement

scholarly journals Non-equilibrium critical behavior of Heisenberg thin films

2018 ◽  
Vol 185 ◽  
pp. 11005
Author(s):  
Maria A. Shlyakhtich ◽  
Pavel V. Prudnikov
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Critical Exponents ◽  
Dynamic Method ◽  
Critical Temperatures ◽  
Time Dynamic ◽  
Ferromagnetic Films ◽  
Time Scaling ◽  
Short Time ◽  
Non Equilibrium

In this work we study the non-equilibrium properties of Heisenberg ferromagnetic films using Monte Carlo simulations by short-time dynamic method. By exploring the short-time scaling dynamics, we have found thickness dependency of critical exponents z, θ′ and β/v for ferromagnetic thin film. For calculating the critical exponents of ferromagnetic films we considered systems with linear size L = 128 and layers number N = 2; 4; 6; 10. Starting from initial configurations, the system was updated with Metropolis algorithm at the critical temperatures

scholarly journals Collagen Single Fibril Elastic Modulus Measurement Technique

2014 ◽  
Vol 106 (2) ◽  
pp. 685a
Author(s):  
Pavel Dutov ◽  
Jay D. Schieber ◽  
Olga Antipova ◽  
Sameer Varma ◽  
Joseph Orgel
Keyword(s):  
Elastic Modulus ◽  
Measurement Technique ◽  
Modulus Measurement

scholarly journals Approach for Measuring Elastic Modulus of Thin Film by Scanning Acoustic Microscope.

1993 ◽  
Vol 59 (568) ◽  
pp. 2977-2983
Author(s):  
Akira Todoroki ◽  
Hideo Kobayashi ◽  
Haruo Nakamura ◽  
Wigon Park ◽  
Yoshio Arai ◽  
...  
Keyword(s):  
Thin Film ◽  
Elastic Modulus ◽  
Acoustic Microscope ◽  
Scanning Acoustic Microscope
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