Elastic modulus measurement of ultrathin layer using gas cluster ion beam

ABSTRACTThin-film magnetic sensor and memory devices in future generations may benefit from a processing tool for final-step etching and smoothing of surfaces to nearly an atomic scale. Gas-cluster ion-beam (GCIB) systems make possible improved surface sputtering and processing for many types of materials. We propose application of GCIB processing as a key smoothing step in thin-film magnetic-materials technology, especially spin-valve GMR. Results of argon GCIB etching and smoothing of surfaces of alumina, silicon, permalloy and tantalum films are reported. No accumulating roughness or damage is observed. The distinct scratches and tracks seen in atomic-force microscopy of CMP-processed surfaces, are removed almost entirely by subsequent GCIB processing. The technique primarily reduces high spatial-frequency roughness and renders the topographic surface elevations more nearly gaussian (randomly distributed).

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Argon Gas Cluster Ion Beam for Practical Surface Analysis

Journal of the Vacuum Society of Japan ◽

10.3131/jvsj2.59.134 ◽

2016 ◽

Vol 59 (5) ◽

pp. 134-137

Author(s):

Takuya MIYAYAMA

Keyword(s):

Surface Analysis ◽

Ion Beam ◽

Argon Gas ◽

Cluster Ion ◽

Gas Cluster Ion Beam

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Smoothing of ZnO films by gas cluster ion beam

Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms ◽

10.1016/j.nimb.2005.07.100 ◽

2005 ◽

Vol 241 (1-4) ◽

pp. 630-635 ◽

Cited By ~ 4

Author(s):

H. Chen ◽

S.W. Liu ◽

X.M. Wang ◽

M.N. Iliev ◽

C.L. Chen ◽

...

Keyword(s):

Ion Beam ◽

Zno Films ◽

Cluster Ion ◽

Gas Cluster Ion Beam

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Serial Thick Section Gas Cluster Ion Beam Scanning Electron Microscopy

Microscopy and Microanalysis ◽

10.1017/s1431927618007705 ◽

2018 ◽

Vol 24 (S1) ◽

pp. 1444-1445 ◽

Cited By ~ 1

Author(s):

Kenneth J. Hayworth ◽

David Peale ◽

Zhiyuan Lu ◽

C. Shan Xu ◽

Harald F. Hess

Keyword(s):

Electron Microscopy ◽

Scanning Electron Microscopy ◽

Ion Beam ◽

Thick Section ◽

Beam Scanning ◽

Cluster Ion ◽

Gas Cluster Ion Beam ◽

Scanning Electron

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Fabrication of Bevel Structures by Means of the Spatial Gradient of Ion Dose in Ar Gas Cluster Ion Beam and Its Unique Characteristics

Advanced Materials Interfaces ◽

10.1002/admi.201800825 ◽

2018 ◽

Vol 5 (23) ◽

pp. 1800825

Author(s):

Dong‐Jin Yun ◽

Youngsik Shin ◽

Chang Hoon Jung ◽

Jae Cheol Lee ◽

Sunjung Byun ◽

...

Keyword(s):

Ion Beam ◽

Spatial Gradient ◽

Cluster Ion ◽

Gas Cluster Ion Beam ◽

Ar Gas

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Etching and Surface Smoothing with Gas-Cluster Ion Beams

MRS Proceedings ◽

10.1557/proc-585-27 ◽

1999 ◽

Vol 585 ◽

Cited By ~ 13

Author(s):

D. B. Fenner ◽

R. P. Torti ◽

L. P. Allen ◽

N. Toyoda ◽

A. R. Kirkpatrick ◽

...

Keyword(s):

Surface Science ◽

Ion Beam ◽

Surface Processing ◽

Figures Of Merit ◽

Cluster Ion Beams ◽

Cluster Ion ◽

Gas Clusters ◽

Gas Cluster Ion Beam ◽

Microelectronic Materials ◽

Very High

AbstractSurface processing of microelectronic materials by bombardment with nanoparticles of condensed gases (i.e., clusters) in the form of an ion beam, makes possible etching and smoothing of those surfaces to very high figures of merit. As this is not possible with any conventional ion method, gas-cluster ion-beam systems have great potential in manufacturing. The formation of gas clusters and their collision with surfaces provides an interesting arena for novel physics and surface science. This paper outlines a physical model for the clusters and surface interactions, and provides examples of surface processing. In particular, the reduction of surface roughness while etching by cluster-ion bombardment is illustrated for various materials utilized in microelectronics.

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