Induced transition from Schottky to ohmic contact in In/n-type Si owing to (NH4)2Sx treatment

Author(s):  
Xiu-Yu Lin ◽  
Hsing-Cheng Chang ◽  
Bo-Lin Huang ◽  
Yow-Jon Lin
Keyword(s):  
Author(s):  
A.K. Rai ◽  
A.K. Petford-Long ◽  
A. Ezis ◽  
D.W. Langer

Considerable amount of work has been done in studying the relationship between the contact resistance and the microstructure of the Au-Ge-Ni based ohmic contacts to n-GaAs. It has been found that the lower contact resistivity is due to the presence of Ge rich and Au free regions (good contact area) in contact with GaAs. Thus in order to obtain an ohmic contact with lower contact resistance one should obtain a uniformly alloyed region of good contact areas almost everywhere. This can possibly be accomplished by utilizing various alloying schemes. In this work microstructural characterization, employing TEM techniques, of the sequentially deposited Au-Ge-Ni based ohmic contact to the MODFET device is presented.The substrate used in the present work consists of 1 μm thick buffer layer of GaAs grown on a semi-insulating GaAs substrate followed by a 25 Å spacer layer of undoped AlGaAs.


2020 ◽  
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Qiangjian Sun ◽  
Junhua Long ◽  
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Xinping Huang ◽  
Shuhong Nie ◽  
...  

2002 ◽  
Vol 46 (5) ◽  
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Author(s):  
S.E. Mohney ◽  
B.A. Hull ◽  
J.Y. Lin ◽  
J. Crofton

2014 ◽  
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Author(s):  
Jae-Kwan Kim ◽  
Dong-min Lee ◽  
Sung-Nam Lee ◽  
Keun-Man Song ◽  
Jae-Sik Yoon ◽  
...  
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1995 ◽  
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pp. 71-76 ◽  
Author(s):  
B Ghosh ◽  
S Purakayastha ◽  
P K Datta ◽  
R W Miles ◽  
M J Carter ◽  
...  

1994 ◽  
Vol 65 (4) ◽  
pp. 475-477 ◽  
Author(s):  
D. Brun ◽  
B. Daudin ◽  
E. Ligeon
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2008 ◽  
Vol 41 (17) ◽  
pp. 175105
Author(s):  
Yow-Jon Lin ◽  
Feng-Tso Chien ◽  
Ching-Ting Lee ◽  
Chi-Shin Lin ◽  
Yang-Chun Liu

2003 ◽  
Vol 98 (2) ◽  
pp. 177-180 ◽  
Author(s):  
D. Basak ◽  
S. Mahanty
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