scholarly journals Mn-Co-Ni-O thin films prepared by sputtering with alloy target

2020 ◽  
Vol 9 (1) ◽  
pp. 64-71
Author(s):  
Ruifeng Li ◽  
Qiuyun Fu ◽  
Xiaohua Zou ◽  
Zhiping Zheng ◽  
Wei Luo ◽  
...  
Keyword(s):  
2016 ◽  
Vol 847 ◽  
pp. 143-147
Author(s):  
Ya Dan Li ◽  
Zhuang Hao Zheng ◽  
Ping Fan ◽  
Jing Ting Luo ◽  
Guang Xing Liang ◽  
...  

CoSb3 thermoelectric thin films were prepared on polyimide flexible substrate by radio frequency (RF) magnetron sputtering technology using a cobalt antimony alloy target. Ti and In were added into CoSb3 thin films by co-sputtering. The influence of Ti and In on the thermoelectric properties of CoSb3 thin films was investigated. X-ray diffraction result shows that the major diffraction peaks of all the thin films match the standard peaks related to the CoSb3 phase. The sample has best thermoelectric properties when the Ti sputtering time was 1min and In sputtering time was 30 seconds.


2005 ◽  
Vol 887 ◽  
Author(s):  
S. T. Snyder ◽  
Alex King

ABSTRACTCopper / silver alloy thin films form with a fine, polycrystalline, metastable crystal structure. The expected effects of annealing include grain growth, transformation into the two stable phases, coarsening of the phases, texture formation, and the formation and growth of pinholes or voids. Copper/silver alloy films were deposited on single crystal sodium chloride substrates, via pulsed laser deposition ablation of an alloy target, of the eutectic composition. Free-standing films of 20-30 nm thickness were studied as-deposited and after annealing on copper TEM grids at 100°C for various times. Although several of the expected degradation processes involve short-range diffusion – essentially single atomic jumps – these were not observed, while other, longer-range diffusion effects were clearly identifiable. In particular, void shrinkage was observed in the films at short times, and void growth occurred at longer times.


2011 ◽  
Vol 519 (22) ◽  
pp. 7627-7631 ◽  
Author(s):  
Lijian Meng ◽  
Hui Meng ◽  
Wenjie Gong ◽  
Wei Liu ◽  
Zhidong Zhang

2013 ◽  
Vol 24 (12) ◽  
pp. 4958-4963 ◽  
Author(s):  
Shanshan Zhou ◽  
Ruiqin Tan ◽  
Xin Jiang ◽  
Xiang Shen ◽  
Wei Xu ◽  
...  

2012 ◽  
Vol 428 ◽  
pp. 141-146
Author(s):  
Maryam Mohri ◽  
Mahmud Nili Ahmadabadi

Shape memory thin films deposited by sputtering are attractive candidates for micro-electro-mechanical-system (MEMS) because of their large deformation and strong recovery force. In the present study Ni-Ti thin films have been deposited on NaCl substrates by DC magnetron sputtering source fitted with an 80mm diameter alloy target. In order to obtain a variety of film compositions, several discs of alloy target, which prepared in vacuum arc remelting (VAR), were used. Three types of thin films have been deposited; Ti and Ni-rich thin films were separately deposited on NaCl substrate and also a composite layer of Ni45Ti50Cu5 and Ni-rich. The as deposited Ni-Ti thin films were crystallized to change the amorphous structure to a nanostructured material to characterize shape memory and superelastic behaviors. The effect of composition on film structure and mechanical behavior was studied by using X-ray diffraction (XRD) and nanoindentation. The results of thin films behavior were used to calculate the thickness ratio of be-layer composite NiTi to obtain enhanced shape memory behavior.


Vacuum ◽  
1994 ◽  
Vol 45 (9) ◽  
pp. 967-971 ◽  
Author(s):  
D Popov ◽  
P Mashkov ◽  
D Tzaneva

2016 ◽  
Vol 21 (2) ◽  
pp. 97-101
Author(s):  
Haifang Zhou ◽  
Shuying Cheng ◽  
Pengyi Zhao ◽  
Jinling Yu ◽  
Hongjie Jia
Keyword(s):  

Author(s):  
Satoshi Fujii ◽  
Masahiro Sumisaka ◽  
Gonbin Tang ◽  
Yu Suzuki ◽  
Shohei Otomo ◽  
...  
Keyword(s):  
Al Alloy ◽  

2021 ◽  
pp. 150136
Author(s):  
Myunghwan Byun ◽  
Chung-Soo Kim ◽  
Dong-Hyun Kim ◽  
Jong-Uk Hwang ◽  
Ju-Ho Lee ◽  
...  

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