Multilayers are becoming an increasingly important tool in X-ray optics. The essential parameters to design a pair of laterally graded multilayer mirrors arranged in a Montel-type configuration for use as an X-ray collimating device are provided. The results of X-ray reflectometry tests carried out on the optics in addition to metrology characterization are also shown. Finally, using experimental data and combined with X-ray tracing simulations it is demonstrated that the mirror meets all stringent specifications as required for a novel ultra-high-resolution inelastic X-ray scattering spectrometer at the Advanced Photon Source.
Characterization of stacking faults in thick 3C-SiC crystals using high-resolution diffuse X-ray scattering