Band structure and band offsets in quantum wells

1996 ◽  
Vol 159 (1-4) ◽  
pp. 542-545 ◽  
Author(s):  
M. Livingstone ◽  
I. Galbraith
2003 ◽  
Vol 150 (1) ◽  
pp. 25 ◽  
Author(s):  
X. Marie ◽  
J. Barrau ◽  
T. Amand ◽  
H. Carrère ◽  
A. Arnoult ◽  
...  

1991 ◽  
Vol 240 ◽  
Author(s):  
Emil S. Koteies

ABSTRACTWe have developed a novel experimental technique for accurately determining band offsets in semiconductor quantum wells (QW). It is based on the fact that the ground state heavy- hole (HH) band energy is more sensitive to the depth of the valence band well than the light-hole (LH) band energy. Further, it is well known that as a function of the well width, Lz, the energy difference between the LH and HH excitons in a lattice matched, unstrained QW system experiences a maximum. Calculations show that the position, and more importantly, the magnitude of this maximum is a sensitive function of the valence band offset, Qy, which determines the depth of the valence band well. By fitting experimentally measured LH-HH splittings as a function of Lz, an accurate determination of band offsets can be derived. We further reduce the experimental uncertainty by plotting LH-HH as a function of HH energy (which is a function of Lz ) rather than Lz itself, since then all of the relevant parameters can be precisely determined from absorption spectroscopy alone. Using this technique, we have derived the conduction band offsets for several material systems and, where a consensus has developed, have obtained values in good agreement with other determinations.


2007 ◽  
Vol 515 (10) ◽  
pp. 4488-4491 ◽  
Author(s):  
Dipankar Biswas ◽  
Subindu Kumar ◽  
Tapas Das
Keyword(s):  

2010 ◽  
Vol 42 (8) ◽  
pp. 2131-2133 ◽  
Author(s):  
Sanjib Kabi ◽  
Tapas Das ◽  
Dipankar Biswas
Keyword(s):  

1991 ◽  
Vol 30 (Part 2, No. 9B) ◽  
pp. L1631-L1634 ◽  
Author(s):  
Xiong Zhang ◽  
Kentaro Onabe ◽  
Yoshiki Nitta ◽  
Baoping Zhang ◽  
Susumu Fukatsu ◽  
...  

2019 ◽  
Vol 45 (4) ◽  
pp. 412-418 ◽  
Author(s):  
S. V. Gudina ◽  
Yu. G. Arapov ◽  
V. N. Neverov ◽  
S. M. Podgornykh ◽  
M. R. Popov ◽  
...  

2006 ◽  
Vol 527-529 ◽  
pp. 351-354 ◽  
Author(s):  
M.S. Miao ◽  
Walter R.L. Lambrecht

The electronic driving force for growth of stacking faults (SF) in n-type 4H SiC under annealing and in operating devices is discussed. This involves two separate aspects: an overall thermodynamic driving force due to the capture of electrons in interface states and the barriers that need to be overcome to create dislocation kinks which advance the motion of partial dislocations and hence expansion of SF. The second problem studied in this paper is whether 3C SiC quantum wells in 4H SiC can have band gaps lower than 3C SiC. First-principles band structure calculations show that this is not the case due to the intrinsic screening of the spontaneous polarization fields.


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