Growth of high quality amorphous silicon-germanium films using low pressure remote electron-cyclotron-resonance discharge
1996 ◽
Vol 198-200
◽
pp. 563-566
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2000 ◽
Vol 266-269
◽
pp. 689-693
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Keyword(s):
1997 ◽
Vol 15
(4)
◽
pp. 1951-1954
◽
Radical Fluxes in Electron Cyclotron Resonance Plasma Chemical Vapor Deposition of Amorphous Silicon
1995 ◽
Vol 34
(Part 1, No. 11)
◽
pp. 5965-5970
◽