Fabrication of high quality, low bandgap amorphous Silicon & amorphous Silicon Germanium alloy solar cell by Chemical Annealing

Author(s):  
Ashutosh Shyam
1985 ◽  
Vol 49 ◽  
Author(s):  
H. Itozaki ◽  
N. Fujita ◽  
H. Hitotsuyanagi

AbstractHydrogenated amorphous silicon germanium (a—SiGe:H) films were deposited by photo—chemical vapor deposition (Photo—CVD) of SiH4 and GeH4 with mercury sensitizer. Their band gap was controlled from 0.9 eV to 1.9 eV by changing the gas ratio of SiH4 and GeH4. High quality opto—electrical properties have been obtained for thea—SiGe:H films by Photo—CVD. Hydrogen termination and microstructure of a-SiGe:H were investigated by infrared absorption and transmission electron microscopy. Ana—Si:H solar cell and an a—Si:H/a—SiGe:H stacked solar cell were made, each of which has conversion efficiency 5.3% and 5.1%, respectively.


1988 ◽  
Author(s):  
J.P. Conde ◽  
V. Chu ◽  
S. Tanaka ◽  
D.S. Shen ◽  
S. Wagner

1993 ◽  
Vol 32 (Part 2, No. 8A) ◽  
pp. L1043-L1045 ◽  
Author(s):  
Shou Wei Hsieh ◽  
Chun Yen Chang ◽  
Yeong Shyang Lee ◽  
Chiung Wei Lin ◽  
Biing Sheng Wu ◽  
...  

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