A method for the continuous measurement of thickness and deposition rate of conducting films during a vacuum evaporation
Keyword(s):
1963 ◽
Vol 40
(12)
◽
pp. 557-561
◽
Keyword(s):
Keyword(s):
2014 ◽
Vol 887-888
◽
pp. 783-786
◽
Keyword(s):
Keyword(s):