Metall—2M device for continuous measurement of thickness. (Measurement of thickness of sheet metal using pulse-reflection, suitable since only one side may be accessible)

Ultrasonics ◽  
1970 ◽  
Vol 8 (3) ◽  
pp. 200
Keyword(s):  
Sheet Metal ◽  
Continuous Measurement ◽  
Thickness Measurement ◽  
Measurement Of Thickness

An apparatus for the continuous measurement of thickness during the electropolishing of superconducting cavities

2021 ◽  
Vol 92 (2) ◽  
pp. 023307
Author(s):  
M. Bertucci ◽  
A. Bosotti ◽  
R. Campari ◽  
A. D’Ambros ◽  
A. Gresele ◽  
...  
Keyword(s):  
Continuous Measurement ◽  
Superconducting Cavities ◽  
Measurement Of Thickness

Uncertainty Evaluation in Measurement of Thickness of SiO2/Si Using X-Ray Photoelectron Spectroscopy

2014 ◽  
Vol 915-916 ◽  
pp. 833-837
Author(s):  
Jiang Wei Fan ◽  
Xiao Gang Han ◽  
Feng Wang
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Photoelectron Spectroscopy ◽  
Measurement Method ◽  
Uncertainty Budget ◽  
Thickness Measurement ◽  
Quantitative Model ◽  
X Ray ◽  
Nominal Thickness ◽  
Measurement Of Thickness

Ultra-thin films of SiO2 (nominally 2, 4, 6, 8 and 10nm thick) on silicon, prepared by thermal oxidation, were investigated using x-ray photoelectron spectroscopy (XPS). The thickness of these thin films was obtained from a measurement of the photoelectron intensities originating from the substrate and the oxide layers by applying an appropriate quantitative model. The uncertainty budget of that thickness measurement method is given. The effective attenuation lengths or the corresponding electron inelastic mean free paths are of the most importance in the contribution of the uncertainties. For the SiO2 ultra-thin film with the nominal thickness of 2nm, it could generate 20% of the uncertainty.

An Improved Data Processing Method in Differential White Light Spectral Interferometry for the Measurement of Thickness of Ultra-Thin Metallic Foil

2007 ◽  
Vol 364-366 ◽  
pp. 560-565
Author(s):  
Yan Li Du ◽  
Hui Min Yan ◽  
Xiu Da Zhang
Keyword(s):  
White Light ◽  
Thickness Measurement ◽  
Spectral Interference ◽  
Measuring System ◽  
Source Spectrum ◽  
Interferometric Method ◽  
Metallic Foil ◽  
Interference Fringes ◽  
Data Processing Method ◽  
Measurement Of Thickness

The accurate thickness measurement of Ultra-thin rolling metallic foil has an important role in industrial or some special applications. Unfortunately, commercial thickness meters do not provide high precision measurements non-destructively. A new spectral-domain interferometric method for measuring absolute thickness of Ultra-thin metallic foil is proposed here. The thickness is measured by differential white light spectral interferometer. Two differential Michelson Interferometers (MI) are used as basic measuring system to obtain the spectral interference fringes on the spectrometers. The spectral interference between both beams, which shows up a periodic modulation of the source spectrum with the period dependent on the OPD, serves as an illustration of a technique for measuring both OPDs and displacements in a range dependent on the source spectrum width. Therefore, the interference fringes only depend on the OPD due to the thickness of metallic foil and are unrelated to the position of the foils in the system, which is insensitive to the vibration. The spectral interference fringes are resolved over a wide spectral range and the absolute thickness of metallic foil can be calculated by measuring the OPD with a modified extremum method based on the least root mean square (RMS) deviation. The theoretical analysis and preliminary experiments indicate that the technique can measure the thickness of foils in the range of 1μm to 80μm, and it requires less than 50ms within the single measurement. Experimental results are presented.

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