The low temperature magnetoresistance of arsenic-doped silicon near the metal—Insulator transition

1985 ◽  
Vol 28 (1-2) ◽  
pp. 93-99 ◽  
Author(s):  
W.N. Shafarman ◽  
T.G. Castner ◽  
J.S. Brooks ◽  
K.P. Martin ◽  
M.J. Naughton
1986 ◽  
Vol 56 (25) ◽  
pp. 2771-2771
Author(s):  
W. N. Shafarman ◽  
T. G. Castner ◽  
J. S. Brooks ◽  
K. P. Martin ◽  
M. J. Naughton

2011 ◽  
Vol 82 (3) ◽  
pp. 033705 ◽  
Author(s):  
Worasom Kundhikanjana ◽  
Keji Lai ◽  
Michael A. Kelly ◽  
Zhi-Xun Shen

2021 ◽  
Vol 317 ◽  
pp. 17-21
Author(s):  
Muhammad Syazwan Mohd Sabri ◽  
Nur Ain Athirah Che Apandi ◽  
Norazila Ibrahim

The electroresistance, ER effect of La0.85Ag0.15Mn1-xMoxO3 (x = 0.00 and 0.05) samples prepared using solid method are investigated. The increased of applied current from 5 mA to 10 mA does not change the metal-insulator transition temperature, TMI for both samples however decreased the resistivity in the temperature region of 50 K – 300 K. Both samples exhibit large ER effect at low temperature region. At TMI, the ER value is 75.5% (x =0) and decrease to 34.15% (x = 0.05). However, at 300 K, the value of ER increases to 57 % for Mo substituted sample, and the value decreases to 6.4% for the x =0 sample. The enhanced ER effect at 300 K may be due to the growth of conductive filaments under increased applied current. The increase of applied current may perturb the arrangement of magnetic inhomogeneity induced by Mo substitution, result in reduction of resistivity and lead to the observation of ER effect. These findings suggest potential application of La0.85Ag0.15Mn1-xMoxO3 (x = 0.05) in spintronic devices.


2006 ◽  
Vol 378-380 ◽  
pp. 201-203
Author(s):  
Yoshiki Nakanishi ◽  
Masafumi Oikawa ◽  
Tomoaki Tanizawa ◽  
Tomoyuki Kumagai ◽  
Masahito Yoshizawa ◽  
...  

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