Electronic Raman scattering and the metal-insulator transition in doped silicon

1976 ◽  
Vol 13 (12) ◽  
pp. 5448-5464 ◽  
Author(s):  
Kanti Jain ◽  
Shui Lai ◽  
Miles V. Klein
1986 ◽  
Vol 56 (25) ◽  
pp. 2771-2771
Author(s):  
W. N. Shafarman ◽  
T. G. Castner ◽  
J. S. Brooks ◽  
K. P. Martin ◽  
M. J. Naughton

1985 ◽  
Vol 28 (1-2) ◽  
pp. 93-99 ◽  
Author(s):  
W.N. Shafarman ◽  
T.G. Castner ◽  
J.S. Brooks ◽  
K.P. Martin ◽  
M.J. Naughton

2011 ◽  
Vol 82 (3) ◽  
pp. 033705 ◽  
Author(s):  
Worasom Kundhikanjana ◽  
Keji Lai ◽  
Michael A. Kelly ◽  
Zhi-Xun Shen

1992 ◽  
Vol 7 (7) ◽  
pp. 1788-1794 ◽  
Author(s):  
A.M. Rao ◽  
A.W.P. Fung ◽  
M.S. Dresselhaus ◽  
M. Endo

Raman scattering, x-ray diffraction, and BET measurements are used to study the effect of heat treatment on the microstructure of activated carbon fibers (ACFs) and to correlate the structural changes with the metal-insulator transition observed in the electronic transport properties of heat-treated ACFs. A sequence of events is identified, starting with desorption, followed by micropore collapse plus the stacking of basic structural units in the c-direction, and ending up with in-plane crystallization. The graphitization process closely resembles that depicted by Oberlin's model, except that the final material at high-temperature heat treatment remains turbostratic. Because the metal-insulator transition was observed to occur at heat-treatment temperature THT ≃ 1200 °C, which is well below the THT value (2000 °C) for in-plane crystallization, we conclude that this electronic transition is not due to in-plane ordering but rather to the collapse of the micropore structure in the ACFs. Raman scattering also provides strong evidence for the presence of local two-dimensional graphene structures, which is the basis for the transport phenomena observed in heat-treated ACFs.


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