Impurity incorporation into InSb thin films

1984 ◽  
Vol 116 (1-3) ◽  
pp. 200 ◽  
Author(s):  
J. Goc ◽  
M. Oszwałdowski
2004 ◽  
Vol 267 (1-2) ◽  
pp. 17-21 ◽  
Author(s):  
M.C. Debnath ◽  
T. Zhang ◽  
C. Roberts ◽  
L.F. Cohen ◽  
R.A. Stradling

1978 ◽  
Vol 49 (6) ◽  
pp. 3632-3633 ◽  
Author(s):  
S. Baba ◽  
H. Horita ◽  
A. Kinbara

2019 ◽  
Vol 16 (24) ◽  
pp. 7-12 ◽  
Author(s):  
Hirotaka Nagata ◽  
Shigeo Yamaguchi

2006 ◽  
Vol 21 (12) ◽  
pp. 1543-1546 ◽  
Author(s):  
Tong Zhang ◽  
J J Harris ◽  
W R Branford ◽  
S K Clowes ◽  
L F Cohen ◽  
...  
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2011 ◽  
Vol 254 ◽  
pp. 50-53 ◽  
Author(s):  
Tatsuya Ishii ◽  
Hideyuki Homma ◽  
Shigeo Yamaguchi

We fabricated a thin film Peltier device based on an InSb film and a SbTe film. N-type InSb thin films were grown on sapphire (0001) substrate with InAsSb buffer layer by metalorganic vapor phase epitaxy, and P-type SbTe thin films were deposited on the substrate by electron beam evaporation. N-type and P-type films were separated on the substrate, and between them, a Au thin film was deposited by direct-current sputtering. We observed partial Peltier effect in the device.


1981 ◽  
Vol 85 (3-4) ◽  
pp. 319-322 ◽  
Author(s):  
M. Oszwałdowski ◽  
H. Szweycer ◽  
T. Berus ◽  
J. Goc ◽  
M. Zimpel

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