The effects of deposition variables on deposition rate in the chemical vapour deposition of silicon nitride

1987 ◽  
Vol 155 (1) ◽  
pp. 87-95 ◽  
Author(s):  
Kyoung-Soo Yi ◽  
Ji-Bum Kim ◽  
Kwang-Joon Kim ◽  
John S. Chun
Keyword(s):  
Silicon Nitride ◽  
Deposition Rate ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour

XRD Studies on Residual Stress of the Diamond Films Grown Using Hot Filament Chemical Vapour Deposition Technique on Silicon Nitride and Tungsten Carbide Substrates

2013 ◽  
Vol 686 ◽  
pp. 325-330 ◽  
Author(s):  
Esah Hamzah ◽  
Tze Mi Yong ◽  
Kevin Chee Mun Fai
Keyword(s):  
Residual Stress ◽  
Silicon Nitride ◽  
Tungsten Carbide ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Diamond Films ◽  
Chemical Vapour ◽  
Deposition Technique ◽  
Chemical Vapour Deposition Technique ◽  
Hot Filament

This study analyses residual stress measurement using X-Ray diffraction method on ultrafine-polycrystalline diamonds and polycrystalline diamonds films grown using Hot Filament Chemical Vapour Deposition technique (HFCVD) on silicon nitride(Si3N4) and tungsten carbide (WC) substrates in the same chamber at the same time with varied pretreatments prior to HFCVD diamond deposition. Measurements were taken perpendicular to the surface and the measured residual stress states of the diamond films are in compression. Thus, assuming isotropic properties of the film, the diamond films grown have tension residual stress parallel to the surface of the substrate. Residual stress is estimated to have the lowest stress for substrate that has undergone 5g/liter silicon carbide seeding process. Effects of residual stress to adhesion are discussed for both substrates.

scholarly journals Hot-Wire Chemical Vapour Deposition for Silicon Nitride Waveguides

2016 ◽  
Vol 72 (4) ◽  
pp. 269-272 ◽  
Author(s):  
T. Dominguez Bucio ◽  
A. Tarazona ◽  
A. Z. Khokhar ◽  
G. Z. Mashanovich ◽  
F. Y. Gardes
Keyword(s):  
Silicon Nitride ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Hot Wire

ChemInform Abstract: Preparation of Silicon Nitride with Good Interface Properties by Homogeneous Chemical Vapour Deposition.

ChemInform ◽  
1990 ◽  
Vol 21 (51) ◽  
Author(s):  
B. A. SCOTT ◽  
J. M. MARTINEZ-DUART ◽  
D. B. BEACH ◽  
T. N. NGUYEN ◽  
R. D. ESTES ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Interface Properties ◽  
Homogeneous Chemical
Sign in / Sign up

Export Citation Format

Share Document