Effect of N2O/SiH4 ratio on the properties of low-temperature silicon oxide films from remote plasma chemical vapour deposition

1996 ◽  
Vol 280 (1-2) ◽  
pp. 43-50 ◽  
Author(s):  
Young-Bae Park ◽  
Jin-Kyu Kang ◽  
Shi-Woo Rhee
Keyword(s):  
Low Temperature ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Silicon Oxide ◽  
Oxide Films ◽  
Chemical Vapour ◽  
Remote Plasma ◽  
Plasma Chemical ◽  
Plasma Chemical Vapour Deposition

SiCN alloys obtained by remote plasma chemical vapour deposition from novel precursors

2003 ◽  
Vol 429 (1-2) ◽  
pp. 144-151 ◽  
Author(s):  
T.P. Smirnova ◽  
A.M. Badalian ◽  
L.V. Yakovkina ◽  
V.V. Kaichev ◽  
V.I. Bukhtiyarov ◽  
...  
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Remote Plasma ◽  
Plasma Chemical ◽  
Plasma Chemical Vapour Deposition
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