Low temperature growth of AlN films by microwave plasma chemical vapour deposition using an AlBr3-H2-N2 gas system

1991 ◽  
Vol 202 (2) ◽  
pp. 333-344 ◽  
Author(s):  
Yoshihiro Someno ◽  
Makoto Sasaki ◽  
Toshio Hirai
Keyword(s):  
Low Temperature ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Microwave Plasma ◽  
Chemical Vapour ◽  
Plasma Chemical ◽  
Temperature Growth ◽  
Low Temperature Growth ◽  
Gas System ◽  
Plasma Chemical Vapour Deposition

Diamond film growth by pulse-modulated magnetoactive microwave plasma chemical vapour deposition

1996 ◽  
Vol 281-282 ◽  
pp. 264-266 ◽  
Author(s):  
Akimitsu Hatta ◽  
Hidetoshi Suzuki ◽  
Ken-ichi Kadota ◽  
Toshimichi Ito ◽  
Akio Hiraki
Keyword(s):  
Chemical Vapour Deposition ◽  
Diamond Film ◽  
Vapour Deposition ◽  
Film Growth ◽  
Microwave Plasma ◽  
Chemical Vapour ◽  
Plasma Chemical ◽  
Plasma Chemical Vapour Deposition ◽  
Diamond Film Growth
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